GaN-Based LEDs With Contact-Transferred and Mask-Embedded Lithography and In-Situ N$_{2}$ Treatments

摘要

The authors report that GaN-based LEDs with contact-transferred and mask-embedded lithography (CMEL) and in-situ N $_{2}$ treatments were fabricated. From the experiment results, it can be seen clearly that the characteristic of ITO contacts on the etched p-GaN with the N $_{2}$ treatment-20 sccm shows a near ohmic behavior. With 20 mA current injection, it was found that forward voltage and output power were 3.09 V and 5.16 mW for the LED with CMEL-400 nm-treatment. It was also found that we can achieve 20.5% enhancement for the LED with CMEL-400 nm and do not degrade the electrical properties of the GaN-based LEDs. Furthermore, the reliability of the proposed LED was good.