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Spectral-Directional Emittance of CuO at High Temperatures

机译:高温下CuO的光谱方向发射率

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Spectral-directional emittance measurements for cupric oxide (CuO) are presented. The data cover polar angles of 0-84 deg from the surface normal, wavelengths between 1.5 and 8 μm, and temperatures between 400 and 700℃. The data were generated using a radiometric, direct emission measurement method. The oxide was grown on a very clean, smooth, and mirror-like copper surface, heated in air at 700℃ until emission measurements became constant (270 h). X-ray diffraction and EDS analyses were performed to characterize the spatial and molecular composition of the copper oxide layer. It is generally found that CuO emittance decreases with increasing polar angle, increases with increasing wavelength, and increases with increasing temperature. Spectral-directional emittance values calculated from the Fresnel relations show good agreement with the measurements up to polar angles of 72 deg.
机译:提出了氧化铜(CuO)的光谱方向发射率测量。数据涵盖与表面法线成0-84度的极角,1.5至8μm的波长以及400至700℃的温度。数据是使用辐射直接发射测量方法生成的。氧化物生长在非常干净,光滑且呈镜子状的铜表面上,在700℃的空气中加热,直到发射量恒定(270小时)。进行X射线衍射和EDS分析以表征氧化铜层的空间和分子组成。通常发现,CuO发射率随着极角的增加而降低,随着波长的增加而增加,并且随着温度的升高而增加。由菲涅耳关系计算出的光谱方向的发射率值与极角为72度的测量结果显示出良好的一致性。

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