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机译:衬底温度对射频和直流共溅射制备碲化锑薄膜结构和热电性能的影响
Institute of Thin Film Physics and Application, College of Physics Science and Technology, Shenzhen University, Shenzhen, China;
Institute of Thin Film Physics and Application, College of Physics Science and Technology, Shenzhen University, Shenzhen, China;
Institute of Thin Film Physics and Application, College of Physics Science and Technology, Shenzhen University, Shenzhen, China;
Institute of Thin Film Physics and Application, College of Physics Science and Technology, Shenzhen University, Shenzhen, China;
Institute of Thin Film Physics and Application, College of Physics Science and Technology, Shenzhen University, Shenzhen, China;
Institute of Thin Film Physics and Application, College of Physics Science and Technology, Shenzhen University, Shenzhen, China;
Institute of Thin Film Physics and Application, College of Physics Science and Technology, Shenzhen University, Shenzhen, China;
Thermoelectric thin film; antimony telluride; magnetron sputtering; cosputtering;
机译:衬底温度对射频和直流共溅射制备碲化锑薄膜结构和热电性能的影响
机译:RF磁控溅射沉积功率对柔性基材锑碲化酰胺结晶度和热电性能的影响
机译:溅射功率密度对DC磁控溅射沉积的柔性热电锑蛋白膜热电和力学性能的影响
机译:基材温度对植物ZnO和AlN薄膜结构和光学性质的影响
机译:氢退火和衬底温度对射频溅射氧化锌薄膜性能的影响
机译:银含量取决于电沉积碲化锑薄膜的热导率和热电性能
机译:基板温度和膜厚对HPPMS和直流磁控溅射Ge薄膜的热,电和结构性能的影响