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首页> 外文期刊>Journal of Electronic Materials >Influence of Substrate Temperature on Structural and Thermoelectric Properties of Antimony Telluride Thin Films Fabricated by RF and DC Cosputtering
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Influence of Substrate Temperature on Structural and Thermoelectric Properties of Antimony Telluride Thin Films Fabricated by RF and DC Cosputtering

机译:衬底温度对射频和直流共溅射制备碲化锑薄膜结构和热电性能的影响

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摘要

Antimony and tellurium were deposited on BK7 glass using direct-current magnetron and radiofrequency magnetron cosputtering. Antimony telluride thermoelectric thin films were synthesized with a heated substrate. The effects of substrate temperature on the structure, surface morphology, and thermoelectric properties of the thin films were investigated. X-ray diffraction patterns revealed that the thin films were well crystallized. c-Axis preferred orientation was observed in thin films deposited above 250°C. Scanning electron microscopy images showed hexagonal crystallites and crystal grains of around 500 nm in thin film fabricated at 250°C. Energy-dispersive spectroscopy indicated that a temperature of 250°C resulted in stoichiometric Sb2Te3. Sb2Te3 thin film deposited at room temperature exhibited the maximum Seebeck coefficient of 190 μV/K and the lowest power factor (PF), S 2 σ, of 8.75 × 10−5 W/mK2. When the substrate temperature was 250°C, the PF increased to its highest value of 3.26 × 10−3 W/mK2. The electrical conductivity and Seebeck coefficient of the thin film were 2.66 × 105 S/m and 113 μV/K, respectively.
机译:使用直流磁控管和射频磁控管共溅射,将锑和碲沉积在BK7玻璃上。碲化锑热电薄膜是在加热的基材上合成的。研究了基板温度对薄膜的结构,表面形态和热电性能的影响。 X射线衍射图表明该薄膜充分结晶。在250°C以上沉积的薄膜中观察到了c轴的优选取向。扫描电子显微镜图像显示在250°C制备的薄膜中六角形微晶和约500 nm的晶粒。能量色散光谱法表明,温度为250°C时产生化学计量的Sb2 Te3 。在室温下沉积的Sb2 Te3 薄膜的最大塞贝克系数为190μV/ K,最低功率因数(PF)S 2 σ为8.75×10-5 < / sup> W / mK2 。当基板温度为250°C时,PF升高到最高值3.26×10-3 W / mK2 。薄膜的电导率和塞贝克系数分别为2.66×105 S / m和113μV/ K。

著录项

  • 来源
    《Journal of Electronic Materials 》 |2012年第4期| p.679-683| 共5页
  • 作者单位

    Institute of Thin Film Physics and Application, College of Physics Science and Technology, Shenzhen University, Shenzhen, China;

    Institute of Thin Film Physics and Application, College of Physics Science and Technology, Shenzhen University, Shenzhen, China;

    Institute of Thin Film Physics and Application, College of Physics Science and Technology, Shenzhen University, Shenzhen, China;

    Institute of Thin Film Physics and Application, College of Physics Science and Technology, Shenzhen University, Shenzhen, China;

    Institute of Thin Film Physics and Application, College of Physics Science and Technology, Shenzhen University, Shenzhen, China;

    Institute of Thin Film Physics and Application, College of Physics Science and Technology, Shenzhen University, Shenzhen, China;

    Institute of Thin Film Physics and Application, College of Physics Science and Technology, Shenzhen University, Shenzhen, China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Thermoelectric thin film; antimony telluride; magnetron sputtering; cosputtering;

    机译:热电薄膜;碲化锑;磁控溅射;共溅射;

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