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首页> 外文期刊>Journal of Electroceramics >Oriented growth of Bi3.25La0.75Ti3O12 thin films on RuO2/SiO2/Si substrates by using the polymeric precursor method: Structural, microstructural and electrical properties
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Oriented growth of Bi3.25La0.75Ti3O12 thin films on RuO2/SiO2/Si substrates by using the polymeric precursor method: Structural, microstructural and electrical properties

机译:聚合前驱体法在RuO2 / SiO2 / Si衬底上定向生长Bi3.25 La0.75 Ti3 O12 薄膜:结构,微结构和电性能

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摘要

c-axis oriented Bi3.25La0.75Ti3O12 (BLT) thin films were grown on a RuO2 top electrode deposited on a (100) SiO2/Si substrate by the polymeric precursor method. X-ray diffraction and atomic force microscope investigations indicate that the films exhibit a dense, well crystallized microstructure having random orientations with a rather smooth surface morphology. The electrical properties of preferred oriented Bi3.25La0.75Ti3O12 (BLT) thin films deposited on RuO2 bottom electrode leaded to a large remnant polarization (P r ) of 17.2 μC/cm2 and (V c ) of 1.8 V, fatigue free characteristics up to 1010 switching cycles and a current density of 2.2 μA/cm2 at 5 V. We found that the polarization loss is insignificant with nine write/read voltages at a waiting time of 10,000 s. Independently of the applied electric field the retained switchable polarization approached a nearly steady-state value after a retention time of 10 s.
机译:在沉积在(100)上的RuO2 顶部电极上生长c轴取向的Bi3.25 La0.75 Ti3 O12 (BLT)薄膜。聚合前驱体法制备SiO2 / Si基体X射线衍射和原子力显微镜研究表明,该膜表现出致密的,良好结晶的微观结构,具有随机取向,具有相当光滑的表面形态。在RuO2 底部电极上沉​​积的取向较好的Bi3.25 La0.75 Ti3 O12 (BLT)薄膜的电学性质导致较大的残留极化(P r )为17.2μC/ cm2 ,(V c )为1.8 V,高达1010 开关周期的无疲劳特性,电流密度为2.2μA/在5 V下为cm2 。我们发现,在等待10,000 s的时间内有9个写入/读取电压,极化损耗微不足道。与施加的电场无关,在10 s的保留时间后,保留的可切换偏振接近于稳态值。

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