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Growth and electrical properties of Pb(Zr,Ti)O_3 thin films by a chemical solution deposition method using zirconyl heptanoate as zirconium source

机译:以庚二酸锆为锆源的化学溶液沉积法生长Pb(Zr,Ti)O_3薄膜及其电性能

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摘要

Pb(Zr,Ti)O_3 (PZT) thin films were prepared on (111) Pt-coated Si substrates by a chemical solution deposition method using zirconyl heptanoate as zirconium source instead of commonly used zirconium alkoxides. The effects of processing conditions on the microstructure and electrical properties of the PZT thin films were investigated. The texture of the PZT thin films could be changed by selecting different heat-treatment methods. Orientation-dependent electrical properties, including dielectric constant, polarization, and coercive field, were examined. The randomly oriented PZT thin films annealed at 600℃ for 0.5 h showed a well-defined ferroelectric hysteresis loop with a remanent polarization of 18 μC/cm~2 and a coercive field of 74 kV/cm.
机译:通过化学溶液沉积法,使用庚酸锆基酯作为锆源,而不是常用的烷氧基锆,通过化学溶液沉积法在(111)涂有Pt的Si衬底上制备Pb(Zr,Ti)O_3(PZT)薄膜。研究了工艺条件对PZT薄膜微观结构和电学性能的影响。通过选择不同的热处理方法可以改变PZT薄膜的织构。检查了与方向有关的电性能,包括介电常数,极化和矫顽场。随机取向的PZT薄膜在600℃退火0.5 h时表现出清晰的铁电磁滞回线,剩余极化强度为18μC/ cm〜2,矫顽场为74 kV / cm。

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