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Growth and characterizations of bulk ZnSe single crystal by chemical vapor transport

机译:ZnSe单晶的化学汽相生长及其表征

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The bulk ZnSe single crystal was grown from the vapor by Zn(NH_4)_3Cl_5 transport from ZnSe polycrystals source, which was synthesized from commercial grade high-purity elements, selenium and zinc. The growth temperature between the source and the growing ZnSe single crystal was 898-915℃ and the temperature difference of the growth tube was 14-18℃. The orange ZnSe single crystal of φ9 x 25mm was obtained. The studies on the features and habit of the growth surface show that the growth surface of as-grown ZnSe crystal was composed of {11 l}and {100} faces. The crystal quality of ZnSe crystal was investigated by RO-XRD. The FWHM value of RO-XRD patterns of ZnSe (111) face is 24s. The photoluminescence spectrum is dominated by two broad peaks located at 439 and 418 nm, respectively. The etch pit density is about (5-7) x 10~4cm~(-2). The absorption edge is very sharp and is located at about 465 nm. All of the above results indicate that a ZnSe single crystal with high crystalline quality and high purity can be grown from the vapor by Zn(NH_4)_3Cl_5 transport.
机译:ZnSe块状单晶是由ZnSe多晶源中的Zn(NH_4)_3Cl_5传输从蒸汽中生长而来的,后者是由商业级高纯度元素,硒和锌合成的。源与生长的ZnSe单晶之间的生长温度为898-915℃,生长管的温差为14-18℃。获得了φ9×25mm的橙色ZnSe单晶。对生长表面的特性和习性的研究表明,生长的ZnSe晶体的生长表面由{11 l}和{100}面组成。通过RO-XRD研究了ZnSe晶体的晶体质量。 ZnSe(111)面的RO-XRD图案的FWHM值为24s。光致发光光谱由分别位于439和418 nm的两个宽峰主导。刻蚀坑密度约为(5-7)×10〜4cm〜(-2)。吸收边缘非常锋利,位于约465 nm。以上所有结果表明,可以通过Zn(NH_4)_3Cl_5传输从蒸气中生长出具有高结晶质量和高纯度的ZnSe单晶。

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