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首页> 外文期刊>Journal of Crystal Growth >Thermal diffusion studies of MBE-grown ZnSe/Fe/ZnSe and ZnS/Fe/ZnS structures
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Thermal diffusion studies of MBE-grown ZnSe/Fe/ZnSe and ZnS/Fe/ZnS structures

机译:MBE生长的ZnSe / Fe / ZnSe和ZnS / Fe / ZnS结构的热扩散研究

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摘要

This study focused on the investigation of the thermal stability of Fe on ZnSe and ZnS matrix using secondary ion mass spectroscopy (SIMS). Sandwiched three layer source structures of ZnSe/Fe/ZnSe and ZnS/Fe/ZnS were grown on GaAs and GaP substrates, respectively, by the molecular beam epitaxy technique. The bottom II-VI layers and the Fe-sandwiched layers in these structures are single crystalline while the top II-VI layers are polycrystalline. Thermal annealing was conducted in a range covering from 320 to 550 ° C. The SIMS depth profiles of the as-grown and annealed structures reveal that (100) oriented single crystalline Fe/ZnSe interface is thermally stable at temperature as high as 450 ° C while its polycrystalline counterpart suffers from fast diffusion even at the growth temperature. In contrast, (100) oriented polycrystalline Fe/ZnSe interface is quite stable at least up to 200 ° C. For both ZnSe/Fe/ZnSe and ZnS/ Fe/ZnS systems, (111) oriented structures were found to have lower thermal stability than (100) oriented ones. These results provide important findings towards the optimization of Fe-based tunneling magneto-resistance structures using a II-VI semiconductor barrier. © 2005 Published by Elsevier B.V.
机译:这项研究的重点是使用二次离子质谱(SIMS)研究Fe在ZnSe和ZnS基质上的热稳定性。 ZnSe / Fe / ZnSe和ZnS / Fe / ZnS夹层三层源结构分别通过分子束外延技术生长在GaAs和GaP衬底上。这些结构中的底部II-VI层和Fe夹层为单晶,而顶部II-VI层为多晶。热退火在320〜550℃的范围内进行。生长和退火结构的SIMS深度剖面表明,(100)取向的单晶Fe / ZnSe界面在高达450°D的温度下是热稳定的。 C,而其多晶对应物甚至在生长温度下也遭受快速扩散。相反,(100)取向的多晶Fe / ZnSe界面至少在高达200&DEG时是相当稳定的。对于ZnSe / Fe / ZnSe和ZnS / Fe / ZnS系统,发现(111)取向的结构的热稳定性低于(100)取向的结构。这些结果为使用II-VI半导体势垒优化铁基隧道磁阻结构提供了重要的发现。 &复制; 2005由Elsevier B.V.发布

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