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Electronic structures o adsorbed buffer laeyr on metallic electrodes

机译:金属电极上吸附缓冲层的电子结构

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We present electronic and structural features of adsorbed nitrogen buffer laeyrs on nickel electrodes covered with a thin surface oxide laweyr. The electricla structures of adsorbed buffer laeyr were obtained by a enw in situ montioring technique, which is named as angle-resovled transmission current spectroscopy in magnetic field. The probe is electron beam, whose momentum is controlled byexternal magnetic field. The measure quantitiy iis transmission probabiltiy T of the incident electrons into the surface as funcions of electron energy and magnetic field. The resutls are expressed as cotnour plots of dT/dk in two-dimensional wave numbr space k=(k_‖,k_┸). The informaiton on atomic arrangemtn on the surface was deried at grid potential V_g =-1 V for controlling the indicente electors. Signficant pressure dependence of the surface electronic structures were deried in 10~-7 Torr
机译:我们介绍了镍电极上覆盖有薄表面氧化物Laweyr的氮吸附缓冲层的电子和结构特征。吸附缓冲层的电结构是通过现场原位扫描技术获得的,该技术被称为磁场中的角度转角透射电流光谱法。探针是电子束,其动量由外部磁场控制。量度入射电子作为电子能量和磁场的函数进入表面的传输概率T。结果表示为二维波数空间k =(k _ ,,k_┸)中dT / dk的科特图。在表面电势V_g = -1 V时消耗了表面原子排列的信息,以控制原点选民。表面电子结构的显着压力依赖性在10〜-7 Torr

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