首页> 外文期刊>Journal of Crystal Growth >Oxygen distribution in silicon melt during a standard Czochralski process studied by sensor measuremetns and comparison to numerical simulation
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Oxygen distribution in silicon melt during a standard Czochralski process studied by sensor measuremetns and comparison to numerical simulation

机译:标准Czochralski过程中硅熔体中的氧分布,通过传感器测量研究并与数值模拟进行比较

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摘要

The distribution of oxygen in silicon melts kept in a 14" diameter silica crucible of a sandard Czochralski puller was measured using an electrochemicla oxygen-sensor. Three different situations were analyzed; without the presence of a crystal and with 4" diameter crystals being pulled at crucible rotation rates of 2 and 5 rpm. The experimental resuts are discussed within the frame of existing modelling results in he literature and own simultions. It is found that boundary conditions and models which are presently propose din the literature are obviosly no adequate to provide quantitkative correlation with experimental data.
机译:使用电化学氧传感器测量了在Sandard Czochralski拉拔器的14“直径二氧化硅坩埚中保持的硅熔体中氧的分布。分析了三种不同的情况;不存在晶体,而在4英寸直径的晶体被拉出时坩埚转速为2和5 rpm。在文献和自己的simultion现有建模结果的框架内讨论了实验结果。发现目前在文献中提出的边界条件和模型显然不足以提供与实验数据的定量相关性。

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