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Dopants and defects in InN and InGaN alloys

机译:InN和InGaN合金中的掺杂剂和缺陷

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We have performed systematic studies of the effects of high-energy particle irradiation on the properties of InGaN alloys. In agreement with the amphoteric defect model, irradiation of InN produces donor-like defects. The electron concentration increases with increasing radiation dose and saturates at 4 X 10(20) cm(-3) at very high doses. We find that the increase of the electron concentration causes a large blue-shift of the absorption edge, which is well explained by the Burstein-Moss effect. The maximum electron concentration decreases with increasing Ga fraction in irradiated In1-xGaxN alloys as the conduction band edge approaches the Fermi level stabilization energy (E-FS). For x > 0.66 the conduction band edge moves above E-FS and the irradiation of n-type films produces acceptor-like defects, resulting in a reduced free electron concentration. An analysis of the concentration dependence of the electron mobility in InN indicates that the dominant defects in irradiated InN are triply charged donors. Finally, we show that InN films doped with Mg acceptors behave like undoped films above a threshold radiation dose. (c) 2006 Elsevier B.V. All rights reserved.
机译:我们已经对高能粒子辐照对InGaN合金性能的影响进行了系统的研究。与两性缺陷模型一致,InN的辐射会产生供体样缺陷。电子浓度随着辐射剂量的增加而增加,并在非常高的剂量下达到4 X 10(20)cm(-3)饱和。我们发现,电子浓度的增加引起吸收边缘的大蓝移,这可以通过布尔斯坦-莫斯效应很好地解释。随着导带边缘接近费米能级稳定能(E-FS),在辐照的In1-xGaxN合金中,最大电子浓度随Ga分数的增加而降低。当x> 0.66时,导带边缘移动到E-FS上方,n型膜的辐照会产生类似受体的缺陷,从而导致自由电子浓度降低。对InN中电子迁移率的浓度依赖性分析表明,被辐照的InN中的主要缺陷是三电荷供体。最后,我们表明掺杂了Mg受体的InN薄膜的行为类似于高于阈值辐射剂量的未掺杂薄膜。 (c)2006 Elsevier B.V.保留所有权利。

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