首页> 外文期刊>Journal of Crystal Growth >Growth and structural analysis of diluted magnetic oxide Co-doped CeO_(2-δ) films deposited on Si and SrTiO_3 (100)
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Growth and structural analysis of diluted magnetic oxide Co-doped CeO_(2-δ) films deposited on Si and SrTiO_3 (100)

机译:在Si和SrTiO_3上沉积的稀磁氧化Co-掺杂的CeO_(2-δ)薄膜的生长和结构分析(100)

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The diluted magnetic oxide, Co-doped CeO_(2-δ), displays ferromagnetism at room temperature [A. Tiwari, V.M. Bhosle, S. Ramachandran, N. Sudhakar, J. Narayan, S. Budak, A. Gupta, Appl. Phys. Lett. 88 (2006) 142511; B. Vodungbo, Y. Zheng, F. Vidal, D. Demaille, V.H. Etgens, D.H. Mosca, Appl. Phys. Lett. 90 (2007) 062510]. For this study, Co-doped CeO_(2-δ) thin films were grown on silicon and SrTiO_3 substrates by pulsed laser deposition. Their structure was analyzed using X-ray diffraction and transmission electron microscopy. On native silicon wafer, the films are textured. The preferential orientation is CeO_2 (100) for a growth under oxygen ambient (0.05 mbar) and CeO_2 (111) for a growth under vacuum (10~(-6) mbar). When a buffer layer of CeO_2 is previously deposited under oxygen ambient, the films adopt the CeO_2 (100) preferential orientation, even if subsequent growth is carried out under vacuum. On SrTiO_3 (100), the films are epitaxied under oxygen ambient or under vacuum with an oxygen-grown CeO_2 buffer layer. In epitaxial films grown under vacuum, increasing contents of Co atoms (below 7%) induce an expansion of the CeO_2 unit cell and a decrease of crystalline order. The relationship between the structural order and the magnetic behaviour, in particular the magnetic anisotropy, is discussed. The present study suggests that the ferromagnetic behaviour is not related to grain boundaries and that the epitaxy strains are not responsible for the magnetic anisotropy. This strongly supports a ferromagnetism related to point defects (oxygen vacancies) in Co-doped CeO_(2-δ) films.
机译:稀磁性氧化物Co掺杂的CeO_(2-δ)在室温下显示出铁磁性[A.提瓦里(V.M.) Bhosle,S。Ramachandran,N。Sudhakar,J。Narayan,S。Budak,A。Gupta,应用。物理来吧88(2006)142511; B.Vodungbo,Y.Zheng,F.Vidal,D.Demaille,V.H. Etgens,D.H. Mosca,Appl。物理来吧90(2007)062510]。对于本研究,通过脉冲激光沉积在硅和SrTiO_3衬底上生长了Co掺杂的CeO_(2-δ)薄膜。使用X射线衍射和透射电子显微镜分析它们的结构。在天然硅晶圆上,将薄膜纹理化。对于在氧气环境(0.05 mbar)下的生长优先取向是CeO_2(100),对于在真空(10〜(-6)mbar)下的生长优先取向是CeO_2(111)。当预先在氧气环境下沉积CeO_2的缓冲层时,即使随后的生长在真空下进行,该膜也会采用CeO_2(100)优先取向。在SrTiO_3(100)上,在氧气环境下或真空下,利用氧气生长的CeO_2缓冲层将膜外延。在真空下生长的外延膜中,Co原子含量的增加(低于7%)导致CeO_2晶胞的膨胀和晶序的减少。讨论了结构顺序与磁性能,特别是磁各向异性之间的关系。本研究表明,铁磁行为与晶界无关,外延应变与磁各向异性无关。这有力地支持了与共掺杂CeO_(2-δ)薄膜中的点缺陷(氧空位)有关的铁磁性。

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