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Epitaxial growth and magnetic characterization of ferromagnetic Co_4N thin films on SrTiO_3(001) substrates by molecular beam epitaxy

机译:SrTiO_3(001)衬底上铁磁Co_4N薄膜的外延生长和分子束外延表征

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摘要

We have attempted to grow single-crystalline Co_4N thin films on SrTiO_3 (STO)(001) substrates by molecular beam epitaxy by the simultaneous supply of 3N-Co and radio-frequency NH_3 plasma. Reflection high-energy electron diffraction and 6-2$ X-ray diffraction patterns confirmed that the epitaxial growth of Co_4N films was successfully achieved. X-ray φ-scan measurements using Co_4N(301) and STO(301) diffractions revealed that the epitaxial relationship between Co_4N and STO was a cube-on-cube type. Magnetization versus magnetic field curves measured at room temperature for Co_4N epitaxial layers covered with a Au capping layer using a vibrating sample magnetometer showed that Co_4N[110] is the axis of easy magnetization.
机译:我们试图通过同时提供3N-Co和射频NH_3等离子体,通过分子束外延在SrTiO_3(STO)(001)衬底上生长单晶Co_4N薄膜。反射高能电子衍射和6-2 $ X射线衍射图谱证实成功完成了Co_4N薄膜的外延生长。使用Co_4N(301)和STO(301)衍射进行的X射线φ扫描测量显示,Co_4N和STO之间的外延关系是立方立方的。使用振动样品磁力计在室温下测量的覆盖有Au覆盖层的Co_4N外延层的磁化强度与磁场曲线表明,Co_4N [110]是易磁化轴。

著录项

  • 来源
    《Journal of Crystal Growth》 |2011年第1期|p.40-43|共4页
  • 作者单位

    Institute of Applied Physics, University , 1-1-1 Tennohdai, Tsukuba, Ibaraki 305-8573, Japan;

    Institute of Applied Physics, University , 1-1-1 Tennohdai, Tsukuba, Ibaraki 305-8573, Japan;

    Institute of Applied Physics, University , 1-1-1 Tennohdai, Tsukuba, Ibaraki 305-8573, Japan;

    National Institute of Advanced Industrial Science and Technology (AIST), ICAN, 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan;

    Institute of Applied Physics, University , 1-1-1 Tennohdai, Tsukuba, Ibaraki 305-8573, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    A3. Molecular beam epitaxy; BI.C0_4N; B1. SrTiO_3; B2. Ferromagnetic material;

    机译:A3。分子束外延;BI.C0_4N;B1。 SrTiO_3;B2。铁磁材料;

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