首页> 外文期刊>Journal of Crystal Growth >Thermally stimulated current spectroscopy applied on defect characterization in semi-insulating Cd_(0.9)Zn_(0.1)Te
【24h】

Thermally stimulated current spectroscopy applied on defect characterization in semi-insulating Cd_(0.9)Zn_(0.1)Te

机译:热激发电流光谱法在半绝缘Cd_(0.9)Zn_(0.1)Te中的缺陷表征中的应用

获取原文
获取原文并翻译 | 示例
       

摘要

Defects exhibiting trapping behaviors in semi-insulating (SI) materials were investigated by thermally stimulated current (TSC) spectroscopy. The variation of measurement conditions during the initial photoexcitation and thermal emission, such as the heating rate, bias voltage, illumination time and delay time, may bring some significant effects on TSC spectra, leading to incomplete characterization of trap levels. In this work, defects with deep levels in the band gap of SI-Cd_(0.9)Zn_(0.1)Te crystal, grown by the modified vertical Bridgman (MVB) method, were studied via TSC measurements. TSC measurement of the Sl-CZT sample was performed with the optimized measurement conditions. Ten different traps and a deep donor (E_(dd)) level were characterized from the as-obtained spectrum in the temperature range from 25 to 310 K with the aid of simultaneous multiple peak analysis (SIMPA). The origins of these traps were identified in detail as well.
机译:通过热刺激电流(TSC)光谱研究了在半绝缘(SI)材料中表现出俘获行为的缺陷。初始光激发和热发射过程中测量条件的变化(例如加热速率,偏置电压,照明时间和延迟时间)可能会对TSC光谱产生重大影响,从而导致陷阱能级的表征不完整。在这项工作中,通过TSC测量研究了通过改进的垂直Bridgman(MVB)方法生长的SI-Cd_(0.9)Zn_(0.1)Te晶体的带隙中具有较深能级的缺陷。用优化的测量条件对S1-CZT样品进行TSC测量。借助同时多峰分析(SIMPA),在25至310 K的温度范围内,从所获​​得的光谱中表征了十个不同的阱和一个深的供体(E_(dd))水平。这些陷阱的起源也被详细鉴定。

著录项

  • 来源
    《Journal of Crystal Growth》 |2012年第2012期|25-29|共5页
  • 作者单位

    State Key Laboratory of Solidification Processing, School of Materials Science and Engineering, Northwestern Polytechnical University, Xi'an 710072, China;

    State Key Laboratory of Solidification Processing, School of Materials Science and Engineering, Northwestern Polytechnical University, Xi'an 710072, China;

    State Key Laboratory of Solidification Processing, School of Materials Science and Engineering, Northwestern Polytechnical University, Xi'an 710072, China;

    Science Institute, Air Force Engineering University, Xi'an 710051, China;

    State Key Laboratory of Solidification Processing, School of Materials Science and Engineering, Northwestern Polytechnical University, Xi'an 710072, China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    A1. Characterization; A1. Defects; A2. Bridgman technique; B1. Cadmium compounds; B2. Semiconducting cadmium compounds; B2. Semiconducting II-VI materials;

    机译:A1。表征;A1。缺陷;A2。布里奇曼技术;B1。镉化合物;B2。半导体镉化合物;B2。半导体II-VI材料;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号