机译:添加铜或钴对熔盐法生长β-FeSi_2的影响
Graduate School of Science and Technology, Shizuoka University, 3-5-1 Johoku, Naka-ku, Hamamatsu, Shizuoka 432-8011, Japan;
Graduate School of Science and Technology, Shizuoka University, 3-5-1 Johoku, Naka-ku, Hamamatsu, Shizuoka 432-8011, Japan;
Faculty of Engineering, Shizuoka University, 3-5-1 Johoku, Naka-ku, Hamamatsu, Shizuoka, 432-8561, Japan;
Faculty of Engineering, Shizuoka University, 3-5-1 Johoku, Naka-ku, Hamamatsu, Shizuoka, 432-8561, Japan;
Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Naka-ku, Hamamatsu 432-8011, Japan;
Faculty of Engineering, Shizuoka University, 3-5-1 Johoku, Naka-ku, Hamamatsu, Shizuoka, 432-8561, Japan;
A1. diffusion; A1. impurities; A2. growth from solutions; B2. semiconducting silicon compounds;
机译:由熔融盐沉积的β-FeSi_2层的生长
机译:Li和Cu的添加对熔融LiCl-KCl低共熔盐中Fe-40at。%Al金属间化合物腐蚀的影响
机译:熔融盐沉积在FeSi上的β-FeSi_2层的结构特性
机译:熔盐法制备Cu_2ZNSN_(1-X)GE_XS_4单晶
机译:Cu-Si中硅的熔融盐电沉积
机译:纳米粒子添加对不同热条件下Cu / Sn-Ag-Cu / Cu焊点中金属间化合物(IMCs)的形成和生长的影响
机译:盐对熔盐法制备板状氧化铝颗粒晶体生长的影响