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Heat losses in a CVD reactor for polysilicon production: Comprehensive model and experimental validation

机译:用于多晶硅生产的CVD反应器中的热损失:全面的模型和实验验证

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摘要

This work addresses heat losses in a CVD reactor for polysilicon production. Contributions to the energy consumption of the so-called Siemens process are evaluated, and a comprehensive model for heat loss is presented. A previously-developed model for radiative heat loss is combined with conductive heat loss theory and a new model for convective heat loss. Theoretical calculations are developed and theoretical energy consumption of the polysilicon deposition process is obtained. The model is validated by comparison with experimental results obtained using a laboratory-scale CVD reactor. Finally, the model is used to calculate heat consumption in a 36-rod industrial reactor; the energy consumption due to convective heat loss per kilogram of polysilicon produced is calculated to be 22-30 kWh/kg along a deposition process.
机译:这项工作解决了用于多晶硅生产的CVD反应器中的热损失。评估了所谓的西门子过程对能源消耗的贡献,并提出了一个综合的热损失模型。先前开发的辐射热损失模型与传导性热损失理论相结合,并建立了对流热损失的新模型。进行了理论计算,并获得了多晶硅沉积工艺的理论能耗。通过与使用实验室规模的CVD反应器获得的实验结果进行比较来验证该模型。最后,该模型用于计算36杆工业反应堆中的热量消耗。在沉积过程中,每公斤多晶硅产生的对流热损失所产生的能耗经计算为22-30 kWh / kg。

著录项

  • 来源
    《Journal of Crystal Growth》 |2014年第15期|138-146|共9页
  • 作者单位

    Instituto de Energia Solar - Universidad Politecnica de Madrid, ETSI Telecomunicacion, Avda. Complutense 30, 28040 Madrid, Spain;

    Departamento de Ingenieria quimica, Fac. De Ciencias Quimicas, Universidad Complutense, Avda. Complutense s, 28040 Madrid, Spain;

    Instituto de Energia Solar - Universidad Politecnica de Madrid, ETSI Telecomunicacion, Avda. Complutense 30, 28040 Madrid, Spain;

    Instituto de Energia Solar - Universidad Politecnica de Madrid, ETSI Telecomunicacion, Avda. Complutense 30, 28040 Madrid, Spain;

    Instituto de Energia Solar - Universidad Politecnica de Madrid, ETSI Telecomunicacion, Avda. Complutense 30, 28040 Madrid, Spain;

    Instituto de Energia Solar - Universidad Politecnica de Madrid, ETSI Telecomunicacion, Avda. Complutense 30, 28040 Madrid, Spain;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    A1. Heat transfer mechanisms; A3. Chemical vapor deposition (CVD); B1. Polysilicon; B2. Solar grade silicon;

    机译:A1。传热机制;A3。化学气相沉积(CVD);B1。多晶硅B2。太阳能级硅;
  • 入库时间 2022-08-17 13:14:18

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