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首页> 外文期刊>Journal of Crystal Growth >Influence of compressive strain on the arsenic incorporation in MOVPE-grown InAsP/InP single quantum wells
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Influence of compressive strain on the arsenic incorporation in MOVPE-grown InAsP/InP single quantum wells

机译:压缩应变对MOVPE生长的InAsP / InP单量子阱中砷掺入的影响

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摘要

In this paper we have studied the effect of MOVPE growth conditions on the arsenic incorporation in strained InAsP quantum wells (QWs) grown on InP substrates. Lower growth temperatures result in an enhanced arsenic incorporation, as well as an improvement in the quality of the heterostructure. It is seen that an increase in the arsine flux does not readily increase the arsenic composition I the film which is dependent on temperature, strain and growth condi- tions.
机译:在本文中,我们研究了MOVPE生长条件对InP衬底上生长的应变InAsP量子阱(QW)中砷掺入的影响。较低的生长温度导致砷结合增加,异质结构的质量得到改善。可以看出,rs通量的增加并不容易增加膜中的砷成分,这取决于温度,应变和生长条件。

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