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首页> 外文期刊>Journal of Computational Electronics >Monte Carlo modeling of X-valley leakage in quantum cascade lasers
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Monte Carlo modeling of X-valley leakage in quantum cascade lasers

机译:量子级联激光器中X谷泄漏的Monte Carlo建模

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This paper presents the first comprehensive Monte Carlo simulation of GaAs/AlGaAs quantum cascade lasers (QCLs) that takes both Γ- and X-valley transport into account and investigates the effect of X-valley leakage on the QCL performance. Excellent agreement with experimental data is obtained for the GaAs/Al_(0.45)Ga_(0.55)As QCL at cryogenic and room temperatures. The model reveals two carrier-loss mechanisms into the X valley: coupling of the Γ continuum-like states with the X states in the same stage, and coupling between the Γ localized states in the simulated stage with the X states in the next stage. Simulation results demonstrate that the 45% Al QCL has small X-valley leakage at both 77 K and 300 K, due to the very good confinement of the Γ states, stemming from the high Al content.
机译:本文介绍了GaAs / AlGaAs量子级联激光器(QCL)的第一个全面的蒙特卡罗模拟,该模型同时考虑了Γ和X谷传输,并研究了X谷泄漏对QCL性能的影响。在低温和室温下,GaAs / Al_(0.45)Ga_(0.55)As QCL与实验数据具有极好的一致性。该模型揭示了两个进入X谷的载流子损失机制:在同一阶段将Γ连续谱态与X状态耦合,在模拟阶段将Γ局部态与下一阶段X状态耦合。仿真结果表明,由于高铝含量对Γ状态的很好限制,45%Al QCL在77 K和300 K时都有很小的X谷泄漏。

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