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首页> 外文期刊>Journal of Computational Electronics >Impact of inelastic phonon scattering in the OFF state of Tunnel-field-effect transistors
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Impact of inelastic phonon scattering in the OFF state of Tunnel-field-effect transistors

机译:隧道场效应晶体管在截止状态下非弹性声子散射的影响

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We study the impact of electron-phonon interaction on the subthreshold operation region of Tunnel-FETs by means of full-quantum simulations. Our approach is based on the nonequilibrium Green's function method, where acoustic and optical phonon scatterings are taken into account through the self-consistent Born approximation. Two device architectures are analyzed: InAs nanowire longitudinal Tunnel-FETs, and 2D vertical Tunnel-FETs based on either an GaSb/AlSb/InAs heterostructure or a MoS/WTe van der Waals heterojunction. In InAs nanowire Tunnel-FETs with interface traps, electron-phonon interaction deteriorates the subthreshold swing by allowing trap-assisted tunneling at energies higher than the valence-band edge in the source. In vertical heterojunction Tunnel-FETs, optical phonon scattering increases the OFF current by inducing inelastic transition in the overlap region even in the absence of traps.
机译:我们通过全量子模拟研究了电子-声子相互作用对Tunnel-FET的亚阈值工作区域的影响。我们的方法基于非平衡格林函数方法,该方法通过自洽的Born近似考虑了声子和声子的声子散射。分析了两种器件架构:InAs纳米线纵向隧道FET和基于GaSb / AlSb / InAs异质结构或MoS / WTe范德华异质结的2D垂直隧道FET。在具有界面陷阱的InAs纳米线隧道FET中,电子-声子相互作用通过允许陷阱辅助隧穿能量高于源中价带边缘的能量而恶化了亚阈值摆幅。在垂直异质结隧道FET中,即使在没有陷阱的情况下,光子散射也会在重叠区域中引起非弹性跃迁,从而增加了OFF电流。

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