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首页> 外文期刊>Journal of circuits, systems and computers >The Optimizations of Dual-Threshold Independent-Gate FinFETs and Low-Power Circuit Designs
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The Optimizations of Dual-Threshold Independent-Gate FinFETs and Low-Power Circuit Designs

机译:双阈值独立栅极FinFET和低功耗电路设计的优化

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In this paper, a method of optimizing dual-threshold independent-gate FinFET devices is discussed, and the optimal circuit design is carried out by using these optimized devices. Dual-threshold independent-gate FinFETs include low threshold devices and high threshold devices. The low threshold device is equivalent to two merging parallel short-gate devices and high threshold device is equivalent to two merging series SG devices. We optimize the device mainly by selecting the appropriate gate work function, gate oxide thickness, silicon body thickness and so on. Our optimization is based on the Berkeley BSIMIMG model and verified by TCAD tool. Based on these optimized devices, we designed the compact basic logic gates and two new compact D-type flip-flops. Additionally, we developed a circuit synthesis method based on Binary Decision Diagram (BDD) and the optimized compact basic logic gates. Hspice simulations show that the circuits using the proposed dual-threshold IG FinFETs have better performance than the circuits directly using the short-gate devices.
机译:在本文中,讨论了一种优化双阈值独立栅极FinFET器件的方法,并且通过使用这些优化的设备来执行最佳电路设计。双阈值独立栅极FinFET包括低阈值设备和高阈值设备。低阈值设备相当于两个合并并联短栅极设备,并且高阈值设备相当于两个合并系列SG设备。我们主要通过选择适当的浇口工作功能,栅极厚度,硅本身厚度等来优化该装置。我们的优化基于Berkeley Bsimimg模型,并由TCAD工具验证。基于这些优化的设备,我们设计了紧凑的基本逻辑门和两个新的Compact D型触发器。此外,我们开发了一种基于二进制决策图(BDD)和优化的紧凑型基本逻辑门的电路合成方法。 HSPICE模拟表明,使用所提出的双阈值IG FinFET的电路比使用短栅极设备直接的电路更好地具有更好的性能。

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