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Extended Curves of the Space Charge, Electric Field, and Free Carrier Concentration at the Surface of a Semiconductor, and Curves of the Electrostatic Potential Inside a Semiconductor

机译:半导体表面的空间电荷,电场和自由载流子浓度的扩展曲线,以及半导体内部的静电势曲线

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摘要

This article is an extension of work begun by R. H. Kingston and S. F. Neustadter [J. Appl. Phys. 26, 718 (1955)]. They calculated the space charge, electric field, and change in free carrier concentration for a semiconductor surface. Their results may be expressed as functions of the deviation for the Fermi energy from its intrinsic value in the bulk and at the surface. Curves calculated from their results may be used for any nondegenerate semiconductor at any temperature, provided that the donor and acceptor levels are completely ionized. The curves presented in the above‐mentioned article, however, are extensively applicable only to germanium or semiconductors of similar energy gap. The extended curves presented in this article enable computations to be applied to materials of higher energy gap, such as silicon and gallium arsenide, over a wide resistivity range. Also, in this article several curves of electrostatic potential inside a semiconductor have been computed. A few of these curves were presented previously by G. C. Dousmanis and R. C. Duncan, Jr. [J. Appl. Phys. 29, 1627 (1958)]. The curves presented in this article are intended to supplement those previously presented.
机译:本文是R. H. Kingston和S. F. Neustadter [J.应用物理26,718(1955)]。他们计算了半导体表面的空间电荷,电场和自由载流子浓度的变化。他们的结果可以表示为费米能量与其在主体和表面处的固有值之间的偏差的函数。根据其结果计算得出的曲线可在任何温度下用于任何未退化的半导体,只要施主和受主能级完全电离即可。但是,上述文章中提供的曲线仅广泛适用于锗或具有类似能隙的半导体。本文提供的扩展曲线使计算可以应用于在较宽的电阻率范围内具有较高能隙的材料,例如硅和砷化镓。同样,在本文中,已经计算出半导体内部的几条静电势曲线。其中一些曲线是由G. C. Dousmanis和R. C. Duncan,Jr. [J.应用物理29,1627(1958)]。本文中提供的曲线旨在补充先前提供的曲线。

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  • 来源
    《Journal of Applied Physics》 |1961年第3期|共4页
  • 作者

    Young Charles E.;

  • 作者单位
  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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