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Electroluminescence from Ge‐Doped GaP p—n Junctions

机译:Ge掺杂GaP p-n结的电致发光

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摘要

The electroluminescence from GaP containing Ge has been studied. p—n junctions were formed by the liquid epitaxy method. The peak of the dominant emission from these diodes is near 1.96 eV at 77°K. The maximum external quantum efficiency at 77°K was 8%. The emission appears to involve Zn and Ge pairs even though these impurities were doped on opposite sides of the junction. It was not possible to ascribe any emission lines to recombination involving Te and Ge. Current, voltage, and intensity dependences of the diodes have been measured. The results indicate that radiative recombination between Zn and Ge at 77°K is predominantly in the space‐charge region. At low currents, photon‐assisting tunneling becomes important.
机译:已经研究了来自包含Ge的GaP的电致发光。通过液体外延方法形成PN结。这些二极管的主要发射峰在77°K时接近1.96 eV。 77°K时的最大外部量子效率为8%。即使这些杂质掺杂在结的相对侧,该发射似乎也包含Zn和Ge对。不可能将任何发射线归因于涉及Te和Ge的复合。已经测量了二极管的电流,电压和强度依赖性。结果表明,Zn和Ge在77°K下的辐射复合主要发生在空间电荷区域。在低电流下,光子辅助隧穿变得非常重要。

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    《Journal of Applied Physics》 |1968年第3期|共4页
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  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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