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Motion of Inclusion Induced by a Direct Current and a Temperature Gradient

机译:直流电和温度梯度引起的夹杂物运动

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摘要

We have analyzed the migration of spherical and cylindrical inclusions under a direct current and a thermal gradient in an infinite medium and near a planar boundary. Our study of inclusion motion in an infinite medium is concerned primarily with the application of the marker‐motion technique to measure mass transport in the lattice. It is shown that, in addition to the lattice motion, there are contributions to marker movement coming from mass transport by surface and volume diffusion, which is induced by the change of potential gradient on the marker surface. To measure the true lattice velocity, the marker used must be a good insulator compared to the matrix material, and its size should exceed a few microns. The study of inclusion motion near a boundary is for analyzing pore migration by electromigration in thin films. Three cases have been considered, which include a spherical pore near a plane and between two planes and a cylindrical pore connected to two planes. We concluded that the pore migration in the lattice is due to surface electromigration and the planar boundary generally increases pore velocity and distorts its shape during migration.
机译:我们分析了在无限大介质中和平面边界附近的直流电和热梯度下球形和圆柱形夹杂物的迁移。我们对无限介质中夹杂物运动的研究主要涉及标记运动技术在晶格中测量质量传输的应用。结果表明,除晶格运动外,还有由于表面和体积扩散引起的质量迁移而引起的标记运动,这是由标记表面电位梯度的变化引起的。为了测量真实的晶格速度,与基质材料相比,所使用的标记物必须是良好的绝缘体,并且其尺寸应超过几微米。研究边界附近的夹杂物运动是为了分析薄膜中电迁移引起的孔迁移。已经考虑了三种情况,包括在一个平面附近和两个平面之间的球形孔以及连接到两个平面的圆柱形孔。我们得出的结论是,晶格中的孔迁移是由于表面电迁移引起的,并且平面边界通常会在迁移过程中增加孔速度并扭曲其形状。

著录项

  • 来源
    《Journal of Applied Physics》 |1970年第1期|共5页
  • 作者

    Ho Paul S.;

  • 作者单位

    Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14850;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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