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Capacitance spectroscopy studies of degraded AlxGa1-xAs DH stripe‐geometry lasers

机译:退化AlxGa1-xAs DH条纹几何激光器的电容光谱研究

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The deep‐level transient capacitance spectroscopy (DLTS) technique has been used to study changes in double‐heterostructure (DH) AlxGa1-xAs proton‐bombarded stripe‐geometry lasers during accelerated aging at 70 °C. The DLTS spectra of these lasers consist of three dominant peaks: two shallow traps with activation eneriges of 0.31 eV (majority carrier trap) and 0.21 eV (minority carrier trap) and a deep majority carrier trap with an activation energy of 0.89 eV. The deep trap signal changes dramatically during the first 100 h of cw laser operation at 70 °C, while the two shallow traps change in concentration by only about 10–20%. This deep trap signal increases by over an order of magnitude in lasers of moderate reliability (∼103 h at 70 °C) but is observed to decrease in lasers with very long lifetimes. It is shown that this deep level is introduced by the proton damage and is initially located at the interface between the proton‐damaged layer and the N‐ternary waveguide layer. Finally, studies of the shift in energy of this deep level as a function of aluminum fraction in the AlxGa1-xAs waveguide layer show that this trap is very likely the same as the E3 radiation damage trap. This correlation is significant since the E3 defect is known to be mobile at room room temperature under conditions of electron‐hole recombination and a very efficient nonradiative center in p‐GaAs. If such a center were to move into the p‐type active region, it would be a prime candidate for the source of spatially uniform degradation.
机译:深层瞬态电容光谱法(DLTS)技术已被用于研究70°C加速老化期间双异质结构(DH)AlxGa1-xAs质子轰击的条形几何激光器的变化。这些激光器的DLTS光谱由三个主峰组成:两个浅陷阱,其激活能为0.31 eV(多数载流子陷阱)和0.21 eV(少数载流子陷阱),以及深多数载流子,其激活能量为0.89 eV。在70 C的连续激光操作的前100小时内,深陷阱的信号发生了显着变化,而两个浅陷阱的浓度仅发生了约10–20%的变化。在中等可靠性的激光器中(70 C时约为103 h),该深陷阱信号会增加一个数量级以上,但是在使用寿命很长的激光器中,这种深陷阱信号会减小。结果表明,该深层是由质子损伤引起的,最初位于质子损伤层和N三元波导层之间的界面。最后,研究此深能级的能量位移与AlxGa1-xAs波导层中铝含量的函数关系,结果表明该阱很可能与E3辐射损伤阱相同。这种关联非常重要,因为已知E3缺陷在室温下可在电子空穴复合和p-GaAs中非常有效的非辐射中心的条件下移动。如果这样的中心要移入p型有源区,那么它将是空间均匀退化源的主要候选者。

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    《Journal of Applied Physics》 |1976年第11期|P.4986-4992|共7页
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  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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