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首页> 外文期刊>Journal of Applied Physics >Avalanche buildup time of silicon reach‐through photodiodes
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Avalanche buildup time of silicon reach‐through photodiodes

机译:硅直通光电二极管的雪崩累积时间

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摘要

The avalanche buildup time t, which is related to the multiplication factor (M) by t=τ1 M, where τ1 is the intrinsic response time, is studied for silicon reach‐through avalanche photodiodes (RAPD’s) by a shot‐noise measurement in the GHz region. The dependences of t on both the length of the avalanche region la and the wavelength exciting the avalanche process (λ) are investigated. The τ1 values obtained increase with la in the region la≳1.0 μm and also take larger values for λ∼6300 Å than for λ∼8300 Å. These values are in good agreement with a calculation using the modified Emmons equation τ1=Nkeffla/vs except for the very narrow avalanche region (la≲0.4 μm), where N is a constant dependent on la, keff is the effective ratio of hole to electron ionization rates, and vs is the carrier saturation velocity. These results are very useful to investigate the frequency response of RAPD’s. The diodes discussed are used extensively in fiber transmission systems.
机译:通过在硅片中通过散粒噪声测量来研究硅穿透雪崩光电二极管(RAPD),研究了雪崩累积时间t与乘数(M)乘以t =τ1M,其中τ1是本征响应时间。 GHz区域。研究了t对雪崩区域la的长度和激发雪崩过程的波长(λ)的依赖性。所得的τ1值在la≳1.0μm范围内随la的增加而增加,对于λ〜6300Å,其值也大于λ〜8300Å。这些值与使用改进的Emmons公式τ1= Nkeffla / vs进行的计算非常吻合,除了雪崩区非常窄(la≲0.4μm),其中N是一个常数,取决于la,keff是孔与孔的有效比率。电子电离速率,vs是载流子饱和速度。这些结果对于研究RAPD的频率响应非常有用。讨论的二极管广泛用于光纤传输系统。

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    《Journal of Applied Physics》 |1976年第11期|P.4960-4963|共4页
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  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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