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Spatially resolved EUV emission from focused REB discharges into thin targets

机译:从聚焦REB放电到薄目标的空间分辨EUV发射

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The EUV emission from 10‐ to 100‐mg/cm2‐thick planar targets (Z=6–79) exposed to 60‐nsec‐duration focused relativistic electron beams was examined at current densities of 0.4–1.0 MA/cm2. Spatially resolved spectra were obtained with a stigmatic near‐normal incidence spectrograph, in the wavelength range 500–2100 Å, along axial and radial directions. Time‐resolved EUV data were obtained with windowless photoelectric diodes operated unfiltered and filtered with 0.5‐μm‐thick aluminum. The axial views show copious emission from the diode gap associated with late‐time impedance collapse. Radial views show continuum radiation which is emitted from the region of the target exposed to the focused REB and line radiation which originates from a lower‐density (approximately 1019 cm-3) more‐extended late‐time plasma resulting from foil expansion. The region of the foil exposed to the focused REB radiates as a blackbody source with a peak temperature of 2–6 eV. These temperatures are a factor of 2 below the calculated temperatures for classical deposition in the foils exposed to the focused beam assuming no hydrodynamic foil expansion.
机译:在电流密度为0.4–1.0 MA / cm2的情况下,检查了暴露于60纳秒持续时间相对论电子束中的10至100 mg / cm2厚的平面靶(Z = 6-79)的EUV发射。空间分辨光谱是通过使用散光的近法线入射光谱仪获得的,其轴向和径向波长范围为500-2100Å。时间分辨的EUV数据是使用未经过滤的无窗光电二极管获得的,并用0.5μm厚的铝过滤。轴向视图显示来自二极管间隙的大量发射与后期阻抗崩溃相关。径向视图显示了从目标区域暴露于聚焦REB的区域发出的连续辐射,而线辐射则是由于箔扩展而导致的较低密度(约1019 cm-3)的后期等离子体产生的。暴露于聚焦REB的箔区域以黑体源辐射,峰值温度为2–6 eV。假定没有流体动力箔片膨胀,这些温度比暴露于聚焦光束的箔片中经典沉积的计算温度低2倍。

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    《Journal of Applied Physics 》 |1978年第1期| P.113-120| 共8页
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  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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