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Thermoelectric properties of splat‐cooled amorphous In20Te80, Ga20Te80, and Ge15Te85

机译:平板冷却的非晶In20Te80,Ga20Te80和Ge15Te85的热电性能

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The electrical transport properties of splat‐cooled amorphous semiconductors In20Te80, Ga20Te80, and Ge15Te85 were investigated by measuring the thermoelectric power S and dc resistivity ρ between 140 and 300 °K. For as‐quenched samples, both S and logρ show linear relationships with 1/T, indicating a p‐type intrinsiclike conduction ≳90% due to holes. To account for this intrinsiclike conduction, we propose a high degree of structural integrity in the splat‐cooled amorphous samples, i.e., a structure having the homogeneity of the liquid and consisting of continuous Te chains with In, Ga, and Ge attached to broken bonds. However, annealed samples show extrinsiclike conduction from 0 to -130 °C, and both S and logρ show decrease linearly with respect to the decrease of temperature T. The effect of heat treatment interpreted as a structural disordering, appears due to atomic segregation at local areas.
机译:通过测量140至300 K之间的热电功率S和直流电阻率ρ,研究了板冷非晶半导体In20Te80,Ga20Te80和Ge15Te85的电输运特性。对于淬火后的样品,S和logρ均与1 / T呈线性关系,这表明由于空穴而引起的p型本征似电conduction90%。为了解决这种固有的传导,我们建议在经过单板冷却的非晶态样品中具有高度的结构完整性,即一种具有液体均质性且由连续的Te链组成的结构,其中连续的Te链具有连接到断裂键上的In,Ga和Ge 。然而,退火后的样品在0至-130 C的温度下表现出非本征性传导,并且S和logρ均相对于温度T的降低呈线性下降。热处理的作用被解释为结构无序,这是由于局部原子的偏析引起的。地区。

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    《Journal of Applied Physics》 |1978年第1期|P.280-284|共5页
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  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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