Analysis of stress effects on the domain and field configuration of SiFe sheets with coating

摘要

For domain analyses a new colloid technique was used that allows observations on coated sheets without application of an external magnetic field. Application of tensile stress decreased domain wall spacing and eliminated spike, tree, and other supplementary structure. Low compression caused extensive domain widening linked with the formation of tree patterns. With rising compression an increasing proportion of transverse domains of decreasing width was formed. Stress‐caused modifications of the tangential field configuration of magnetized coated samples were studied by means of computer‐controlled raster scanning with Hall plates. Compression generated both an increased field homogeneity accompanied also be increased local magnetic resistivity at almost all points of the sample. Tensile stress caused modifications differing from point to point.