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Reduction of cell size in hybrid bubble memory devices (abstract)

机译:减少混合气泡存储设备中的单元大小(抽象)

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Hybrid bubble memory devices using ion‐implanted and Permalloy bubble propagation tracks have been proposed and developed. In this paper, the reduction of the cell size from 4 to 3 μm will be discussed. In the hybrid devices, the minor loops are composed of ion‐implanted tracks and the functions are composed of Permalloy tracks. To reduce the cell size, therefore, both of the tracks should be improved. For the 3‐μm‐period ion‐implanted tracks, the bubble diameter is reduced from 1 to 0.8 μm. According to the reduction of a bubble diameter, magnetostrictive anisotropy Δλ=λ100-λ111 is increased from 5 to 8×10-6 because the Sm content is increased to increase the anisotropy field Hk. The large Δλ affects the characteristics of inside and outside turns in the ion‐implanted tracks. To get a good margin for the turns, the anisotropy field change induced by ion implantation ΔHk should be larger than in 4‐μm‐period tracks. There is a new problem in 3‐μm‐period hybrid devices. In the hybrid devices, there is no deep ion implantation in the Permalloy track region, while there is a deep ion implantation in the ion‐implanted track region. The effective bubble height is, therefore, different in the ion‐implanted and Permalloy track region, and the bias field region where bubbles exist stable is different. In the typical 3‐μm‐period devices, the bias field region of the ion‐implanted tracks is 20–30 Oe lower than that of the Permalloy tracks. The operating bias field adjustment (OBA) is needed. We have checked some OBA methods and found that the thinning of the garnet film in the Permalloy track region is a good method. Thinning the garnet film partially, the operating bia-ns field can be adjusted easily and there is no harmful effect.
机译:已经提出并开发了使用离子注入和坡莫合金气泡传播轨迹的混合气泡存储设备。在本文中,将讨论将单元尺寸从4减少到3μm的问题。在混合设备中,次回路由离子注入磁道组成,功能由坡莫合金磁道组成。因此,为了减小单元尺寸,两个轨道都应该得到改善。对于3μm周期的离子注入轨道,气泡直径从1减小到0.8μm。随着气泡直径的减小,磁致伸缩各向异性Δλ=λ100-λ111从5增加到8×10-6,这是因为增加了Sm含量以增加各向异性场Hk。较大的Δλ影响离子注入轨道中的内匝和外匝的特性。为了获得良好的转弯余量,离子注入ΔHk引起的各向异性场变化应大于4μm周期的磁道。在3μm周期的混合设备中存在一个新问题。在混合设备中,坡莫合金轨道区域没有深离子注入,而离子注入轨道区域中没有深离子注入。因此,在离子注入和坡莫合金轨道区域中,有效气泡高度是不同的,气泡稳定存在的偏压场区域也不同。在典型的3μm周期器件中,离子注入轨道的偏置场区域比坡莫合金轨道的偏置场区域低20–30 Oe。需要操作偏置场调整(OBA)。我们检查了一些OBA方法,发现在坡莫合金轨道区域中的石榴石薄膜减薄是一种很好的方法。将石榴石薄膜局部减薄,可以容易地调整工作偏置电场,并且没有有害影响。

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    《Journal of Applied Physics》 |1985年第8期|P.4080-4080|共1页
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  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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