首页> 外文期刊>Journal of Applied Physics >Effect of illumination and annealing on electrical properties of indium tin oxide/poly(3,4-ethylenedioxythiophene): poly(styrenesulfonate)/poly(3-hexylthiophene)/Al device
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Effect of illumination and annealing on electrical properties of indium tin oxide/poly(3,4-ethylenedioxythiophene): poly(styrenesulfonate)/poly(3-hexylthiophene)/Al device

机译:光照和退火对铟锡氧化物/聚(3,4-乙撑二氧噻吩):聚(苯乙烯磺酸盐)/聚(3-己基噻吩)/ Al器件电性能的影响

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摘要

We have studied the modification of electrical properties in poly(3-hexylthiophene) (P3HT) thin film by means of illumination and annealing. The hole mobility of P3HT was monitored by impedance spectroscopy and the density of localized states in the band gap near the Fermi level was calculated using the step-by-step method based on the space-charge-limited-current model. With the illumination, we found that the bulk trap density increased from 2.51 to 2.85×1016 cm-3 eV-1 and the hole mobility of P3HT decreased from 1.88×10-4 cm2 V-1 s-1 to 4.22×10-5 cm2 V-1 s-1. With the annealing at 70 °C for 30 min, it is found that the mobility then partially recovers to 1.18×10-4 cm2 V-1 s-1.
机译:我们已经研究了通过照明和退火改性聚(3-己基噻吩)(P3HT)薄膜的电性能。通过阻抗谱法监测P3HT的空穴迁移率,并基于空间电荷限制电流模型,使用逐步方法计算费米能级附近的带隙中的局部态密度。通过照明,我们发现体陷阱的密度从2.51增加到2.85×1016 cm-3 eV-1,P3HT的空穴迁移率从1.88×10-4 cm2 V-1 s-1减小到4.22×10-5 cm2 V-1 s-1。在70℃下退火30分钟后,发现迁移率部分恢复到1.18×10-4 cm2 V-1 s-1。

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