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Solvent-based preferential deposition of functionalized carbon nanotubes on substrates

机译:在基材上基于溶剂的功能化碳纳米管优先沉积

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摘要

Solution-processed deposition of carbon nanotubes (CNTs) provides a cost-effective means to synthesize uniform vertically or horizontally aligned nanostructures on top of substrates. The efficacy of deposition depends on the solubility of CNTs in the solvent as well as the ordering of nanotubes relative to the substrates. These governing factors, which determine the specific morphologies of CNTs that are deposited, are determined by the molecular interactions between the CNTs and the substrate and solvent molecules. In an effort to mimic the conditions during solution-processed deposition of nanotubes on substrates, we employed molecular dynamics (MD) simulations to study systems comprising CNTs and commonly used solvents toluene and acetone sandwiched between silicon substrates. Both charged and uncharged substrates were simulated to evaluate the effect of electrostatic interactions between nanotubes and substrate on deposition. Comparison of simulated systems with pure and functionalized CNTs indicate that the presence of –COOH functional groups in CNTs is necessary for uniform deposition on substrates. Time-averaged distribution of the angles formed between the axes of the CNTs and that between the nanotubes and substrates demonstrate that functionalized carbon nanotubes (FCNTs) align parallel with the substrates to a greater extent when toluene is used as a solvent. Time-averaged density distributions obtained from our simulations illustrate that FCNTs tend to migrate towards the substrates, especially when the substrates have finite charge density. However, polar acetone molecules form layers on the substrates and thus lead to electrostatic shielding between nanotubes and substrates that hinders deposition. Hence, non-polar solvents such as toluene are more effective for deposition of nanotubes. Based on radial distribution functions (RDFs) and coordination numbers of various atoms of CNTs with respect to solvent atoms as well as with respect to that o- other CNTs, we present a hypothesis that relative extent of coordination between solvent molecules and the functional groups and graphitic component of CNTs determine the solubility and the propensity of parallel alignment of FCNTs in solvents. Overall, results presented in this study provide fundamental insight to predict key factors for solution-processed deposition of well-ordered CNTs on silicon substrates.
机译:碳纳米管(CNT)的固溶处理沉积提供了一种经济高效的方法,可在基板顶部合成均匀的垂直或水平排列的纳米结构。沉积的效率取决于CNT在溶剂中的溶解度以及纳米管相对于基材的排序。这些决定沉积碳纳米管特定形态的控制因素是由碳纳米管与底物和溶剂分子之间的分子相互作用决定的。为了模拟纳米管在基板上进行溶液处理沉积过程中的条件,我们采用分子动力学(MD)模拟来研究包含CNT以及夹在硅基板之间的常用溶剂甲苯和丙酮的系统。模拟带电和不带电的基材,以评估纳米管和基材之间的静电相互作用对沉积的影响。将模拟系统与纯的和功能化的CNT进行的比较表明,CNT中存在–COOH官能团对于在基底上均匀沉积是必需的。 CNT的轴之间以及纳米管和基材之间形成的角度的时间平均分布表明,当使用甲苯作为溶剂时,官能化碳纳米管(FCNT)与基材平行排列的程度更大。从我们的模拟中获得的时间平均密度分布说明FCNT倾向于向基底迁移,特别是当基底具有有限的电荷密度时。然而,极性丙酮分子在基底上形成层,因此导致纳米管和基底之间的静电屏蔽,从而阻碍沉积。因此,非极性溶剂例如甲苯对于纳米管的沉积更有效。基于径向分布函数(RDF)和CNT的各个原子相对于溶剂原子以及相对于其他CNT的配位数,我们提出了一个假设,即溶剂分子与官能团和碳纳米管的石墨成分决定了碳纳米管在溶剂中的溶解度和平行排列的倾向。总体而言,本研究中提供的结果为预测在硅基板上进行有序CNT的溶液处理沉积的关键因素提供了基本见识。

著录项

  • 来源
    《Journal of Applied Physics》 |2013年第7期|1-10|共10页
  • 作者

    Mortuza; S.M.; Banerjee; Soumik;

  • 作者单位

    School of Mechanical and Materials Engineering, Washington State University, Pullman, Washington 99164-2920, USA|c|;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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