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首页> 外文期刊>Journal of Applied Physics >Effect of band alignment on photoluminescence and carrier escape from InP surface quantum dots grown by metalorganic chemical vapor deposition on Si
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Effect of band alignment on photoluminescence and carrier escape from InP surface quantum dots grown by metalorganic chemical vapor deposition on Si

机译:能带对准对硅上金属有机化学气相沉积生长的InP表面量子点的光致发光和载流子逸出的影响

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A detailed analysis of photoluminescence (PL) from InP quantum dots (QDs) grown on Si has been carried out to understand the effect of substrate/host material in the luminescence and carrier escape process from the surface quantum dots. Such studies are required for the development of monolithically integrated next generation III-V QD based optoelectronics with fully developed Si microelectronics. The samples were grown by atmospheric pressure metalorganic chemical vapor deposition technique, and the PL measurements were made in the temperature range 10–80 K. The distribution of the dot diameter as well as the dot height has been investigated from atomic force microscopy. The origin of the photoluminescence has been explained theoretically. The band alignment of InP/Si heterostructure has been determined, and it is found be type II in nature. The positions of the conduction band minimum of Si and the 1st excited state in the conduction band of InP QDs have been estimated to understand the carrier escape phenomenon. A blue shift with a temperature co-efficient of 0.19 meV/K of the PL emission peak has been found as a result of competitive effect of different physical processes like quantum confinement, strain, and surface states. The corresponding effect of blue shift by quantum confinement and strain as well as the red shift by the surface states in the PL peaks has been studied. The origin of the luminescence in this heterojunction is found to be due to the recombination of free excitons, bound excitons, and a transition from the 1st electron excited state in the conduction band (e1) to the heavy hole band (hh1). Monotonic decrease in the PL intensity due to increase of thermally escaped carriers with temperature has been observed. The change in barrier height by the photogenerated electric-field enhanced the capture of the carriers by the surface states rather than their accumulation in the QD excited state. From an anal- sis of the dependence of the PL intensity, peak position, and line width with temperature and excitation source, the existence of free and bound excitonic recombination together with e1 → hh1 transitions in the QDs is established.
机译:已经进行了对生长在Si上的InP量子点(QD)的光致发光(PL)的详细分析,以了解衬底/主体材料对表面量子点的发光和载流子逸出过程的影响。这些研究对于开发具有完整开发的Si微电子学的单片集成下一代基于III-V QD的光电器件是必需的。通过大气压金属有机化学气相沉积技术生长样品,并在10–80 K的温度范围内进行PL测量。通过原子力显微镜研究了点直径的分布以及点高度。从理论上已经解释了光致发光的起源。已经确定了InP / Si异质结构的能带排列,并且发现其本质上是II型。为了理解载流子逸出现象,已经估计了Si的导带最小值和InP QD的导带中的第一激发态的位置。由于不同物理过程(例如量子限制,应变和表面态)的竞争效应,已经发现了PL发射峰的温度系数为0.19 meV / K的蓝移。研究了量子限制和应变引起的蓝移以及PL峰中表面状态引起的红移的相应影响。发现该异质结中的发光的起源是由于自由激子​​,结合的激子的复合以及从导带(e1)中的第一个电子激发态到重空穴带(hh1)的过渡。观察到由于热逸出的载流子随温度增加而导致PL强度单调下降。由光生电场引起的势垒高度的变化增强了表面状态对载流子的捕获,而不是它们在QD激发态下的积累。通过分析PL强度,峰位置和线宽与温度和激发源之间的关系,可以确定QD中自由束缚和激子复合以及e1→hh1跃迁的存在。

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