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首页> 外文期刊>Journal of Applied Physics >Enhanced interlayer coupling and efficient photodetection response of in-situ grown MoS_2-WS_2 van der Waals heterostructures
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Enhanced interlayer coupling and efficient photodetection response of in-situ grown MoS_2-WS_2 van der Waals heterostructures

机译:增强的中间层耦合和高效的光电检修响应原位生长MOS_2-WS_2范德瓦尔斯异质结构

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Currently, 2D layered material (2DLM) based heterostructures, also known as van der Waals (vdW) heterostructures, are actively pursued owing to their great potential for optoelectronic applications. They are produced either by vertical stacking of individual layers or via in-plane stitching of 2DLMs. Producing vdW heterostructures with clean interfaces and growing them using direct growth methods are challenging. Herein, we report successful growth of large-area MoS_2-WS_2 vdW heterostructures (single- to few-monolayer, ML, the thickness of MoS_2 and WS_2) on oxidized Si (100) substrates using the catalyst-free Pulsed Laser Deposition technique. The in-plane (E_(2g)~1) and out-of-plane (A_(1g)) Raman-active phonon modes are used to probe the interlayer interactions between the constituent 2D layers. We observe a blueshift of 4.73 (1.63) cm~(-1) of the A_(1g) peak corresponding to MoS_2 (WS_2) in the MoS_2(1ML)-WS_2(1ML) heterostructure compared to 1.27 (0.88) cm_(-1) for the homo-bilayers. The E_(2g)~1 mode also exhibited blueshift for the heterostructure and redshift for the bilayer of the constituent material. We show that the broadband photodetectors fabricated utilizing in situ grown MoS~2-WS~2 heterostructures exhibit responsivity, specific detectivity, and current on/off ratio as high as 2.51 × 10~5 A/W, 4.20 × 10~(14) Jones, and 1.05 × 10~5, respectively, under 24μW/cm~2 at 405 nm excitation. The successful fabrication of vdW heterostructures using a simple and scalable direct growth method and excellent photodetector performance pave the way for exploitation of their application potential and offer a playground to test some of the theoretical predictions.
机译:目前,基于2D分层材料(2DLM)异质结构,也称为范德华(VDW)异质结构,由于它们对光电应用的巨大潜力而​​追求。它们是通过垂直堆叠各个层或通过2DLMS的平面内缝合而产生的。用干净的接口产生VDW异质结构并使用直接生长方法生长它们是具有挑战性的。在此,我们报告了使用催化剂无脉冲激光沉积技术在氧化的Si(100)基板上的大面积MOS_2-WS_2 VDW异质结构(单层至多单层,MOR,MOS_2和WS_2的厚度)的成功增长。平面内(E_(2G)〜1)和外平面外(A_(1G))拉曼有源声子模式用于探测组成2D层之间的层间相互作用。我们在MOS_2(1ML)-WS_2(1ML)异质结构中,观察到对应于MOS_2(WS_2)的A_(1G)峰值的4.73(1.63)cm〜(-1)的BlueShift与1.27(0.88)cm _( - 1 )对于同性恋双层。 E_(2G)〜1模式还表现出用于组成材料双层的异质结构和红移的蓝色。我们表明,利用原位生长MOS〜2-WS〜2异质结构制造的宽带光电探测器表现出响应性,特定探测和电流接通/截止比,高达2.51×10〜5 A / W,4.20×10〜(14)琼斯和1.05×10〜5,分别为405米〜2的24μw/ cm〜2。使用简单且可扩展的直接增长方法和优异的光电探测器性能铺平了促进其应用潜力的方法,并提供游乐场来测试一些理论预测的游戏,从而制造VDW异质结构。

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  • 来源
    《Journal of Applied Physics 》 |2021年第15期| 155304.1-155304.11| 共11页
  • 作者单位

    Centre for Nanoscience and Nanotechnology Panjab University Sector-25 Chandigarh 160014 India;

    Department of Physics and Astrophysics University of Delhi Delhi 110007 India;

    Centre for Nanoscience and Nanotechnology Panjab University Sector-25 Chandigarh 160014 India;

    Department of Physics ARSD College University of Delhi Delhi 110021 India;

    Department of Physics Miranda House University of Delhi Delhi 110007 India;

    School of Physics Beijing Institute of Technology Beijing 100081 People's Republic of China;

    Department of Physics and Astrophysics University of Delhi Delhi 110007 India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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