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Excitations in doped quantum dot induced by accelerating impurity center

机译:杂质中心加速引起的掺杂量子点中的激发

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摘要

We explore the excitation profile of a repulsive impurity doped quantum dot induced by drift of accelerating dopant. The acceleration begins as the velocity of the drifting dopant changes randomly with time. We have considered Gaussian impurity centers. The investigation reveals the roles subtly played by the region of influence of the dopant in conjunction with the dopant strength to modulate the excitation pattern. The investigation also reveals a change in the relative dominance of various factors in influencing the excitation rate as dopant strength increases. The findings seem to be important in the field of impurity diffusion in nanodevices.
机译:我们探索了由加速掺杂剂漂移引起的排斥性杂质掺杂量子点的激发曲线。随着漂移的掺杂剂的速度随时间随机变化,加速度开始。我们已经考虑了高斯杂质中心。研究揭示了掺杂剂影响区域与掺杂剂强度共同调制激发模式的巧妙作用。研究还表明,随着掺杂强度的提高,影响激发速率的各种因素的相对优势也发生了变化。该发现似乎在纳米器件中杂质扩散领域中很重要。

著录项

  • 来源
    《Journal of Applied Physics》 |2011年第v110n5期|p.054314.1-054314.7|共7页
  • 作者

    Nirmal Kr Datta; Manas Ghosh;

  • 作者单位

    Department of Physics, Suri Vidyasagar College, Suri, Birbhum 731101, West Bengal, India;

    Department of Chemistry, Physical Chemistry Section, Visva Bharati University, Santiniketan, Birbhum 731 235, West Bengal, India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

  • 入库时间 2022-08-17 13:58:38

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