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首页> 外文期刊>Journal of Applied Physics >Local C-V mapping for ferroelectrics using scanning nonlinear dielectric microscopy
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Local C-V mapping for ferroelectrics using scanning nonlinear dielectric microscopy

机译:使用扫描非线性介电显微镜的铁电器的本地C-V映射

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摘要

Detailed analysis of local polarization switching will promote the further development of a wide range of applications using ferroelectrics. Here, we propose a local C-V mapping technique using scanning nonlinear dielectric microscopy (SNDM) that enables visualization of dynamic ferroelectric switching behavior in real space. Using this method, C-V butterfly curves characteristic of ferroelectrics can be measured on a scanning probe microscopy platform with nanoscale resolution by virtue of the high capacitance-detection sensitivity of SNDM. This provides real-space mapping of the net switchable polarization, the switching voltage, and the local imprint with a short measurement time (e.g., 10 min or less for 256 × 256 pixels). Furthermore, the proposed method will be useful for study of the electric-field response of domain walls. In this paper, we present some examples of experiments with LiTaO_3 single crystals and HfO_2 -based ferroelectric thin films and give an overview of what kind of evaluation is possible with the local C-V mapping technique.
机译:对局部极化切换的详细分析将促进使用铁电器的各种应用的进一步发展。这里,我们提出了一种局部C-V映射技术,使用扫描非线性介电显微镜(SNDM),其能够在真实空间中可视化动态铁电切换行为。使用该方法,借助于SNDM的高电容检测灵敏度,可以在扫描探针显微镜平台上测量铁电器的C-V蝴蝶曲线。这提供了具有短测量时间的净可切换偏振,开关电压和局部印度的实时映射(例如,10分钟,256×256像素)。此外,所提出的方法可用于研究畴壁的电场响应。在本文中,我们介绍了LiTaO_3单晶和基于HFO_2的铁电薄膜的实验的一些例子,并概述了本地C-V映射技术可以进行的一种评价。

著录项

  • 来源
    《Journal of Applied Physics 》 |2020年第24期| 244105.1-244105.14| 共14页
  • 作者单位

    Research Institute of Electrical Communication Tohoku University Sendai 980-8577 Japan;

    Schooi of Materials and Chemical Technology Tokyo Institute of Technology Yokohama 226-8502 Japan;

    Schooi of Materials and Chemical Technology Tokyo Institute of Technology Yokohama 226-8502 Japan;

    Schooi of Materials and Chemical Technology Tokyo Institute of Technology Yokohama 226-8502 Japan;

    Research Institute of Electrical Communication Tohoku University Sendai 980-8577 Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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