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Velocity bunching dynamics of attosecond electron beam in a DC-gun based high repetition-rate beamline

机译:基于DC枪的高重复速率光束线上的AtsoSecond电子束的速度束缚动力学

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摘要

We investigate the possibility of generating attosecond electron beams with sub-fC charges and a beam energy of a few MeV from a DC-gun and two super-conducting linac based high repetition-rate photoinjector, a promising candidate for next-generation high-flux ultrafast electron diffraction (UED). Using two super-conducting linac photoinjectors, a cascade velocity bunching scheme is adopted to compress the picosecond long e-beam generated by the DC-gun. Thorough dynamic simulations showed that an electron bunch with 2 × 10~3 electrons could be compressed to a few hundreds of attoseconds. In such an ultra-low charge domain, space charge induced slice energy spread is identified to be the main obstacle for further compression, and the final bunch length will become shorter with the reduction of the bunch charge in the power function. Combining merits of the ultra-short bunch duration and the high repetition-rate, such extraordinary electron beams should have great potential to further improve the temporal resolving power of UED facilities.
机译:我们研究了从DC-GU枪和两个超导LINAC基于LINAC基的高重复率光灭绝的副FC电荷和少数MEV的光束能量的可能性,这是下一代高通量的有希望的候选者超快电子衍射(UED)。采用两个超导LINAC光灭吸器,采用级联速度束缚方案压缩了直流枪生成的PICOSECOND长电子束。彻底的动态模拟表明,带有2×10〜3电子的电子束可以压缩到几百个attoseconds。在这种超低电荷域中,空间电荷感应切片能量扩散被识别为进一步压缩的主要障碍物,并且最终束长将较短,随着功率功能中的束充电的减小而变短。结合超短束持续时间和高重复速率的优点,这种非凡的电子束应该具有很大的潜力,以进一步提高UED设施的时间分辨率。

著录项

  • 来源
    《Journal of Applied Physics》 |2020年第15期|154901.1-154901.8|共8页
  • 作者单位

    Institute of Applied Electronics CAEP Mianyang 621900 China;

    Institute of Applied Electronics CAEP Mianyang 621900 China;

    Institute of Applied Electronics CAEP Mianyang 621900 China;

    Institute of Applied Electronics CAEP Mianyang 621900 China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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