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Optical and structural investigations on titanium oxynitride films for visible-UV photocatalytic applications

机译:可见紫外光催化应用的氮氧氮膜上的光学和结构研究

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摘要

We report on the epitaxial growth of titanium oxynitride (TiO_xN_y) films on α-Al_2O_3 (0001) substrates by using a pulsed-laser deposition technique and their optical properties. Using TiN as a solid source, N content (y) in the films was tuned by changing the partial pressure of O_2 gas. The crystalline phase was found to evolve up to y ≈ 0.4 either from rock-salt type or from rutile-type structures. The optical absorption spectra of the films had two distinct components in regions of 0.44-2.4 eV and 2.4-6 eV, which arise from d-d and charge-transfer transitions, respectively. The former transition decreased with decreasing y and vanished at y ≈ 0.26, where a fundamental absorption edge due to the latter transition was found to be 2.4 eV. The results demonstrate a range of anion compositions in the TiO_xN_y being suitable for visible-light harvesting applications.
机译:我们通过使用脉冲激光沉积技术及其光学性质报告α-AL_2O_3(0001)衬底上的氮氧化物(TiO_XN_Y)膜的外延生长。使用锡作为固体源,通过改变O_2气体的分压来调节膜中的N含量(Y)。发现结晶相可以从岩盐型或金红石型结构中从≈0.4演变。薄膜的光学吸收光谱分别在0.44-2.4eV的区域中具有两个不同的组分和2.4-6eV,分别由D-D和电荷转移转变产生。前过渡随着y降低而减小,在Y≈0.26,其中发现由于后一种转变引起的基本吸收边缘为2.4eV。结果表明,TiO_XN_Y中的一系列阴离子组合物适用于可见光采集应用。

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  • 来源
    《Journal of Applied Physics》 |2020年第13期|135301.1-135301.6|共6页
  • 作者单位

    Department of Chemical Science and Engineering Tokyo Institute of Technology 2-12-1 Ookayama Meguro-ku Tokyo 152-8552 Japan;

    Department of Chemical Science and Engineering Tokyo Institute of Technology 2-12-1 Ookayama Meguro-ku Tokyo 152-8552 Japan;

    National Institute for Materials Science (NIMS) 1-1 Namiki Tsukuba 305-0044 Japan Department of Applied Science for Electronics and Materials Kyushu University 6-1 Kasuga-Kouen Kasuga Fukuoka 816-8580 Japan Materials Research Center for Element Strategy (MCES) Tokyo Institute of Technology Yokohama 226-8503 Japan;

    Synchrotron X-ray Station at SPring-8 National Institute for Materials (NIMS) Sayo Hyogo 679-5148 Japan;

    Materials Research Center for Element Strategy (MCES) Tokyo Institute of Technology Yokohama 226-8503 Japan Synchrotron X-ray Group Research Center for Advanced Measurement and Characterization National Institute for Materials (NIMS) Sayo Hyogo 679-5148 Japan;

    Department of Chemical Science and Engineering Tokyo Institute of Technology 2-12-1 Ookayama Meguro-ku Tokyo 152-8552 Japan Materials Research Center for Element Strategy (MCES) Tokyo Institute of Technology Yokohama 226-8503 Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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