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首页> 外文期刊>Journal of Applied Physics >Controlling the persistence of photoconductivity through additional sub-bandgap photoexcitation in individual m-axial GaN nanowires
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Controlling the persistence of photoconductivity through additional sub-bandgap photoexcitation in individual m-axial GaN nanowires

机译:通过额外的子带隙的光透镜在各个M轴向GaN纳米线中控制光电导性的持久性

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The persistence of photoconductivity after switching off the photoexcitation is investigated in individualm-axial n-GaN nanowires as a function of temperature. At room temperature, photoconductivity is found to decay with a time scale of several hours. The capture barrier height is estimated to besimilar to 450meV from the stretched exponential fitting of the decay characteristics recorded at different temperatures. This energy value is found to be much less than the surface band-bending energy ofsimilar to 770meV, which is believed to act as the capture barrier in this system. This finding indicates the tunneling of electrons through the top part of the band-bending barrier. Interestingly, the decay rate of photoconductivity is observed to reduce significantly when the photoconductivity in these wires is quenched by an additional sub-bandgap illumination prior to the switching off the photoexcitation. A rate equation model is proposed to explain the upward band bending at the surface as well as the persistent photoconductivity effect in terms of the transfer of holes between the valence band and acceptor-type surface states of the nanowires. Photoconductivity decay profiles simulated from the model are found to match very well with the experimental data recorded at different temperatures in both quenched and unquenched cases.
机译:在函数轴线N-GaN纳米线中研究了切断光透视后的光电导性的持续性,作为温度的函数。在室温下,发现光电导性衰减几小时的时间等级。从在不同温度下记录的衰减特性的拉伸指数拟合,捕获屏障高度估计到450mev。发现这种能量值远小于定样的表面带弯曲能量,据信这被认为是该系统中的捕获屏障。该发现表示通过带弯曲屏障的顶部的电子隧穿。有趣的是,观察光电导性的衰减率,以显着减少当这些导线中的光电导性通过在切断光透视之前通过附加的子带隙照明淬灭。提出了一种速率等式模型来解释表面处的向上带弯曲,以及在纳米线的价带和受体式表面状态之间的孔的转移方面的持续光电导效应。发现从模型模拟的光电导衰减剖面与在淬火和未通式的情况下的不同温度下记录的实验数据相匹配。

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  • 来源
    《Journal of Applied Physics 》 |2019年第4期| 044302.1-044302.6| 共6页
  • 作者单位

    Indian Inst Technol Dept Phys Mumbai 400076 Maharashtra India;

    Indian Inst Technol Dept Phys Mumbai 400076 Maharashtra India;

    Indian Inst Technol Dept Phys Mumbai 400076 Maharashtra India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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