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首页> 外文期刊>Journal of Applied Physics >The microstructural origin of the enhanced current-perpendicular-to-the-plane giant magnetoresistance by Ag/In-Zn-O/Zn spacer layer
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The microstructural origin of the enhanced current-perpendicular-to-the-plane giant magnetoresistance by Ag/In-Zn-O/Zn spacer layer

机译:Ag / In-Zn-O / Zn间隔层增强电流垂直于平面的巨磁电阻的微观结构起源

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摘要

The mechanism of the enhancement of the current-perpendicular-to-the-plane giant magnetoresistance ratio (Delta R/R) by a Ag/In-Zn-O (IZO)/Zn spacer layer for the spin-valves with Co-2(Mn0.6Fe0.4) Ge Heusler alloy ferromagnetic layers was investigated. The insertion of a thin Ag (0.2-0.6 nm) layer below the IZO layer was found to be critical for achieving relatively low resistance-area product (RA) similar to 0.1 Omega mu m(2) and large Delta R/R up to 22%. Structural characterizations by scanning transmission electron microscopy revealed that the actual spacer layer was an inhomogeneous Ag-In: Mn-Zn-O nanocomposite, where the Ag-In is thought to play a role in current-confined-path (CCP) for electric current, and the Mn-Zn-O is an oxide matrix which forms by Mn diffusion from the Co-2(Mn0.6Fe0.4) Ge layers and oxidation by In2O3 in IZO. The enhancement of.R/R is explained to be due to the current confinement through the Ag-In CCPs in the Ag-In: Mn-Zn-O nanocomposite spacer, and the lower RA values (0.065-0.011 Omega mu m(2)) for the Ag-In: Mn-Zn-O CCP-spacer than those for the conventional Cu:AlOx CCP-spacer can be understood by assuming a lower resistivity in the Ag-In CCPs. Published by AIP Publishing.
机译:Ag / In-Zn-O(IZO)/ Zn隔离层提高Co-2自旋阀的电流垂直于平面的巨磁阻比(Delta R / R)的机理研究了(Mn0.6Fe0.4)Ge Heusler合金铁磁层。发现在IZO层下面插入一个薄的Ag(0.2-0.6 nm)层对于获得相对较低的电阻面积乘积(RA)类似于0.1 Omegaμm(2)和大的Delta R / R至关重要。 22%。通过扫描透射电子显微镜的结构表征表明,实际的间隔层是不均匀的Ag-In:Mn-Zn-O纳米复合材料,其中Ag-In被认为在电流的电流限制路径(CCP)中起作用Mn-Zn-O是一种氧化物基体,它是由Co-2(Mn0.6Fe0.4)Ge层中的Mn扩散和IZO中的In2O3氧化而形成的。 R / R的增加被解释为归因于当前通过Ag-In:Mn-Zn-O纳米复合间隔物中的Ag-In CCP的限制,以及较低的RA值(0.065-0.011 Omega mu m(2 ))对于Ag-In:Mn-Zn-O CCP间隔物,可以通过假定Ag-In CCP中的电阻率较低来理解,与传统的Cu:AlOx CCP间隔物相比。由AIP Publishing发布。

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  • 来源
    《Journal of Applied Physics》 |2018年第22期|223904.1-223904.6|共6页
  • 作者单位

    Natl Inst Mat Sci, 1-2-1 Sengen, Tsukuba, Ibaraki 3050047, Japan;

    Natl Inst Quantum & Radiol Sci & Technol, 1233 Watanuki, Takasaki, Gumma 3701292, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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