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GaN nanoindentation: A micro-Raman spectroscopy study of local strain fields

机译:GaN纳米压痕:局部应变场的微拉曼光谱研究

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We have investigated strain fields around GaN nanoindentations. Stress relaxation around the edges of the nanoindentation was evident in atomic force microscopy images. More detailed information on the strain fields was obtained from Raman scattering, which has been used to analyze the shape of the strain field around the indentation. We find that the Berkovich tip giving a triangular imprint on the sample generates a strain field, which represents a hexagonal pattern. Negative values of the strain indicate that the residual stress is compressive. Strain is larger in the center of the indentation than outside. Analysis of the ratio of the frequency shift of the E-2 and A(1)(LO) modes suggests that the residual strains are close to biaxial state outside the indentation contact zone, and mostly hydrostatic within the indentation center. (C) 2004 American Institute of Physics.
机译:我们研究了GaN纳米压痕周围的应变场。纳米压痕边缘周围的应力松弛在原子力显微镜图像中很明显。从拉曼散射获得了有关应变场的更多详细信息,该信息已用于分析压痕周围的应变场的形状。我们发现,在样品上产生三角形印记的Berkovich尖端会产生应变场,该应变场表示六边形图案。应变的负值表示残余应力为压缩应力。压痕中心的应变大于外部的应变。对E-2和A(1)(LO)模式的频移比率的分析表明,残余应变在压痕接触区域外接近双轴状态,并且在压痕中心内大部分为静水压。 (C)2004美国物理研究所。

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