Near-surface density of ion-implanted Si studied by Rutherford backscattering and total-reflection x-ray fluorescence

摘要

The implantation of ions in solids is of high technical relevance. The different effects within the solid target caused by the ion bombardment can be investigated by depth profiling of near-surface layers. As and Co ions were implanted in Si wafers: As ions with a fluence of 1 X 10~(17)/cm~2 and an energy of 100 keV and Co ions with 1 X 10~(16)/cm~2 at 25 keV. Subsequently depth profiling was carried out by Rutherford backscattering spectrometry as well as by total-reflection x-ray fluorescence analysis which was combined with differential weighing and interferometry after repeated large-surface sputter etching. Over and above the amorphization of the Si crystal, two other essential effects were observed: (ⅰ) a swelling or expansion of the original Si crystal in the near-surface region, in particular in the case of the As implantation, and (ⅱ) a shrinking or compression of the Si crystal for deeper sublayers especially distinct for the Co implantation. On the other hand, a high surface enrichment of implanted ions was found for the As implantation while only a low surface concentration was detected for the Co implantation.