首页> 外文期刊>Journal of Applied Physics >Keto defect sites in fluorene-based organic field-effect transistors: The origin of rapid degradation on the performance of the device
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Keto defect sites in fluorene-based organic field-effect transistors: The origin of rapid degradation on the performance of the device

机译:芴基有机场效应晶体管中的酮缺陷位:器件性能快速下降的根源

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摘要

The effect of keto defects in fluorene units on the performance of organic field-effect transistors (OFETs) was examined based on fluorene end-capped fused bithiophenes (BFTT) and biphenyl end-capped fused bithiophene oligomers (BPTT). The formation of keto defects after various periods of UV illumination in air on BFTT films was confirmed by the increase of the long-wavelength emission at 2.1-2.3 eV in the photoluminescent (PL) spectrum and the generation of a Fourier transfer infrared (FTIR) peak at 1721 cm~(-1), corresponding to the carbonyl stretching mode of the fluorenone moiety. For both BPTT films irradiated in air and BFTT in nitrogen, i.e., a keto-free system, no increase in long-wavelength emission in the PL spectrum, was found and the peak corresponding to the carbonyl stretching mode of the fluorenone moiety was absent in the FTIR spectrum. The threshold voltage, i.e., switch-on voltage, of the OFETs was increased and the field-effect mobility and on-state drain current were rapidly decreased after the formation of ketonic defects, since these defects induce the formation of numerous trap sites in the band gap of the semiconducting conjugated oligomer. The density of trap sites (N_t) generated after the formation of keto defects was determined using space-charge-limited current spectroscopy. A N_t of around 2.7 X 10~(15) cm~(-3) was found for the BFTT film due to the formation of keto defects after 6 h of UV irradiation.
机译:基于芴末端封端的稠合联噻吩(BFTT)和联苯末端封端的稠合联噻吩低聚物(BPTT),研究了芴单元中酮缺陷对有机场效应晶体管(OFET)性能的影响。 BFTT薄膜在空气中经过不同时间的紫外线照射后,酮缺陷的形成可以通过光致发光(PL)光谱中2.1-2.3 eV处长波长发射的增加以及傅立叶转移红外(FTIR)的产生来证实峰值在1721 cm〜(-1),与芴酮部分的羰基拉伸模式相对应。对于在空气中照射的BPTT膜和在氮气中的BFTT(即无酮系统),在PL光谱中均未发现长波发射的增加,并且在PUR中没有与芴酮部分的羰基拉伸模式相对应的峰。 FTIR光谱。在酮缺陷形成后,OFET的阈值电压(即导通电压)增加,场效应迁移率和通态漏极电流迅速降低,因为这些缺陷会诱导在酮缺陷中形成许多陷阱位点。半导体共轭低聚物的带隙。使用空间电荷限制电流光谱法确定在形成酮缺陷之后产生的陷阱位点的密度(N_t)。对于BFTT膜,发现N_t约为2.7 X 10〜(15)cm〜(-3),这是由于紫外线照射6 h后形成的酮缺陷所致。

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