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首页> 外文期刊>Journal of Applied Physics >Structural properties of Ge nanocrystals embedded in sapphire
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Structural properties of Ge nanocrystals embedded in sapphire

机译:嵌入蓝宝石的Ge纳米晶体的结构特性

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Isotopically pure ~(74)Ge nanocrystals were formed in a sapphire matrix by the ion beam synthesis method. In contrast to those embedded in amorphous silica, sapphire-embedded nanocrystals are clearly faceted and are preferentially oriented with respect to the crystalline matrix. In situ transmission electron microscopy of heated samples reveals that the nanocrystals melt at 955 ± 15℃, very near to the bulk Ge melting point. The Raman spectra indicate that the sapphire-embedded Ge nanocrystals are under compressive stress in the range of 3-4 GPa. The magnitude of the stress is consistent with that expected for hydrostatic pressure arising from solidification. Stress relaxation was not observed for sapphire-embedded Ge nanocrystals; this is attributed to the slow self-diffusion rate of the alumina matrix atoms at temperatures below the nanocrystal melting point.
机译:通过离子束合成方法在蓝宝石基质中形成了同位素纯的〜(74)Ge纳米晶体。与嵌入无定形二氧化硅中的晶体相反,嵌入蓝宝石的纳米晶体具有明显的切面,并且相对于晶体基质优先取向。加热样品的原位透射电子显微镜显示,纳米晶体在955±15℃熔化,非常接近整体Ge熔点。拉曼光谱表明,嵌入蓝宝石的Ge纳米晶体处于3-4 GPa范围内的压缩应力下。应力的大小与固化引起的静水压力的期望值一致。对于蓝宝石嵌入的Ge纳米晶体,未观察到应力松弛。这归因于在低于纳米晶体熔点的温度下氧化铝基质原子的缓慢自扩散速率。

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