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首页> 外文期刊>Journal of Applied Physics >Microstructure-dependent dielectric properties of TbMnO_3 in Au/TbMnO_3/YBa_2Cu_3O_(7-x) capacitors
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Microstructure-dependent dielectric properties of TbMnO_3 in Au/TbMnO_3/YBa_2Cu_3O_(7-x) capacitors

机译:Au / TbMnO_3 / YBa_2Cu_3O_(7-x)电容器中TbMnO_3的微观结构相关介电特性

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Au/TbMnO_3(TMO)/YBa_2Cu_3O_(7-x)(YBCO) capacitors were fabricated on LaAlO_3 (LAO) and SrTiO_3 (STO) substrates under identical conditions. Dielectric properties were measured in the temperature range from 20 to 350 K. High dielectric constants and single dielectric transition peaks were found in both TMO films. The dielectric constants of TMO film on STO substrate were larger than those of TMO film on LAO substrate; correspondingly, the transition temperature of TMO film on STO substrate was higher than that of TMO film on LAO substrate. Although x-ray diffraction showed both TMO films had the same epitaxial orientation, atom force microscopy revealed that the films had different surface morphologies, which originated from the YBCO layers on different substrates. The good surface morphology of YBCO layer and the element diffusion between TMO and YBCO layers may be suggested to be responsible for the significant improvement in the dielectric properties of TMO thin film.
机译:在相同条件下,在LaAlO_3(LAO)和SrTiO_3(STO)衬底上制造Au / TbMnO_3(TMO)/ YBa_2Cu_3O_(7-x)(YBCO)电容器。在20至350 K的温度范围内测量了介电性能。在两种TMO膜中均发现了高介电常数和单个介电跃迁峰。 STO基板上的TMO膜的介电常数大于LAO基板上的TMO膜的介电常数。相应地,STO基板上的TMO膜的转变温度高于LAO基板上的TMO膜的转变温度。尽管X射线衍射显示两张TMO膜具有相同的外延取向,但是原子力显微镜显示该膜具有不同的表面形态,这是由于不同基板上的YBCO层引起的。 YBCO层的良好表面形态以及TMO和YBCO层之间的元素扩散可能被认为是TMO薄膜介电性能的显着改善的原因。

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