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Growth of m-plane GaN quantum wires and quantum dots on m-plane

机译:m面GaN量子线和m面上的量子点的生长

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摘要

Growth of m-plane GaN quantum nanostructures on an A1N buffer layer on m-plane SiC is investigated. GaN nanostructures with different shapes are obtained depending on the A1N buffer layer thickness and the amount of GaN deposited. For A1N buffer layer below 300 nm, GaN quantum wires, elongated perpendicularly to the c axis, are obtained independently of the amount of GaN deposited. For buffer layer thickness above 300 nm, and for an amount of GaN below (above) 5 ML (monolayer), GaN quantum dots (wires) are obtained. The difference in m-plane GaN morphology is related to the buffer layer stress state and to the anisotropic surface diffusion of m-plane GaN. Optical properties suggest an absence of internal quantum confined Stark effect.
机译:研究了在m平面SiC上的AlN缓冲层上生长m平面GaN量子纳米结构。取决于AlN缓冲层的厚度和沉积的GaN的量,获得具有不同形状的GaN纳米结构。对于300 nm以下的AlN缓冲层,可获得与c轴垂直垂直延伸的GaN量子线,而与GaN沉积量无关。对于大于300 nm的缓冲层厚度以及小于(大于)5 ML(单层)的GaN,可以获得GaN量子点(导线)。 m面GaN形态的差异与缓冲层应力状态和m面GaN的各向异性表面扩散有关。光学性质表明不存在内部量子限制的斯塔克效应。

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