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Analytical expressions for the conductance noise measured with four circular contacts placed in a square array

机译:在正方形阵列中放置四个圆形触点所测得的电导噪声的解析表达式

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摘要

In the ideal case, noise measurements with four contacts minimize the contribution of the contact interface. There is a need to characterize conductance noise and noise correction factors for the different geometries provided with four contacts, as already is the case for resistivity measurements with van der Pauw structures. Here, we calculate the noise correction factors for two geometries with a pair of sensors and a pair of current driver electrodes placed in a square array. The first geometry investigated is a very large film compared to the distance L between four circular electrodes, which are placed in a square array far away from the borders of the film. The second is a square-shaped conductive film with side length L and provided with four quarter-circle corner contacts with radius l. The effect of the conductance noise in the film can be observed between current free sensors in a four-point measurement or between current carrying drivers in a two-point measurement.
机译:在理想情况下,使用四个触点进行噪声测量可最大程度地减少触点接口的影响。需要针对具有四个触点的不同几何形状来表征电导噪声和噪声校正因子,正如范德堡结构的电阻率测量的情况一样。在这里,我们使用成对的传感器和一对电流驱动器电极以正方形阵列的形式计算两个几何形状的噪声校正因子。与四个圆形电极之间的距离L相比,所研究的第一个几何形状是非常大的薄膜,四个圆形电极以正方形阵列放置,远离薄膜的边界。第二个是方形导电膜,其边长为L,并设有四个半径为l的四分之一圆角触点。薄膜中的电导噪声的影响可以在四点测量中在无电流传感器之间或在两点测量中在载流驱动器之间观察到。

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