首页> 外文期刊>Journal of Applied Physics >Erratum: 'insight Into Electronic Mechanisms Of Nanosecond-laser Ablation Of Silicon' [j. Appl. Phys. 103, 094902 (2008)]
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Erratum: 'insight Into Electronic Mechanisms Of Nanosecond-laser Ablation Of Silicon' [j. Appl. Phys. 103, 094902 (2008)]

机译:勘误表:“洞察硅的纳秒激光烧蚀的电子机制” [j。应用物理103,094902(2008)]

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摘要

In Sec. III (B), a confusion occurred with using the symbol "e" to indicate the elementary (positive, |e|) and electron (negative, e) charges. Being correct as a whole, Eq. (9) should read as J_e = -en_eμ_eE-eD_e▽n_e, J_h = |e|n_hμ_hE-|e|D_h▽n_h, (9)rnwhere J_e=en_eV_e and J_h=|e|n_hV_h, V_e and V_h are the electron and hole velocities respectively, and the diffusion coefficients are calculated as D_e=kT_eμ_e/|e| and D_e=kT_eμ_e/|e| . In Eqs. (11)-(13), the elementary charge |e| should be used instead of the electron charge e. Importantly, in the simulations the correct expressions were used and the results presented in the original paper are not affected.
机译:在秒在图III(B)中,使用符号“ e”表示基本(正,| e |)和电子(负,e)电荷时发生了混淆。整体上正确,等式。 (9)应该读作J_e =-en_eμ_eE-eD_e▽n_e,J_h = | e |n_hμ_hE-| e | D_h▽n_h,(9)其中J_e = en_eV_e和J_h = | e | n_hV_h,V_e和V_h是电子和孔速度,扩散系数计算为D_e =kT_eμ_e/ | e |和D_e =kT_eμ_e/ | e | 。在等式中(11)-(13),基本电荷| e |应代替电子电荷e。重要的是,在仿真中使用了正确的表达式,原始论文中给出的结果不受影响。

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