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首页> 外文期刊>Journal of Applied Physics >Defects in virgin hydrothermally grown n-type ZnO studied by temperature dependent Hall effect measurements
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Defects in virgin hydrothermally grown n-type ZnO studied by temperature dependent Hall effect measurements

机译:通过温度依赖性霍尔效应测量研究原始水热生长n型ZnO中的缺陷

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摘要

Temperature dependent Hall (TDH) effect measurements have been performed on three virgin and hydrothermally grown ZnO samples with resistivities between ~5 and ~200 Ω cm at room temperature. The electrical conduction observed experimentally in the temperature range of 330-70 K can be accurately described by three donor levels with positions 41-48, 60-66, and ~300 meV below the conduction band edge (E_C) and an acceptor level in the lower part of the energy band gap (E_G). Correlation of the TDH data with results from secondary ion mass spectrometry and admittance spectroscopy on the same samples suggests a rather firm association of the intermediate donor level with complexes involving Al impurities, while the shallowest one is tentatively ascribed to H-related centers. A large fraction of the deep donor remains nonionized in the temperature range studied and contributes substantially to the neutral-impurity-scattering of the conducting electrons. A detailed analysis of the TDH data, using the relaxation time approximation, reveals, however, that ionized-impurity-scattering and optical phonon scattering are the main mechanisms limiting the electron mobility which exhibits a maximum value of ~125 cm~2/V s at ~200 K. The major reason for this modest value is the high concentration of compensating acceptors in the lower part of E_G reaching values of ~3 × 10~(17) cm~(-3) and where Li plays an important role. However, the Li content is not sufficient to account for all the acceptors and additional impurities, excluding group I elements, and/or intrinsic defects have to be considered.
机译:在室温下,对电阻率在〜5和〜200Ωcm之间的三个原始的和水热生长的ZnO样品进行了温度依赖性霍尔(TDH)效应测量。实验中观察到的在330-70 K温度范围内的导电可以通过三个供体能级准确地描述,其位置在导带边缘(E_C)下方41-48、60-66和〜300 meV,并且在电子能级边缘处有一个受体能级能带隙(E_G)的下部。 TDH数据与相同样品上的二次离子质谱和导纳光谱的结果之间的相关性表明,中间供体水平与涉及Al杂质的配合物之间存在相当牢固的联系,而最浅的归因于H相关中心。在所研究的温度范围内,很大一部分深的施主仍保持非离子化状态,并极大地促进了导电电子的中性杂质散射。然而,使用弛豫时间近似法对TDH数据进行的详细分析表明,电离杂质散射和光子声子散射是限制电子迁移率的主要机制,其最大电子迁移率约为125 cm〜2 / V s在〜200 K时,这个适中的值的主要原因是E_G下部的补偿受体浓度高,达到〜3×10〜(17)cm〜(-3)的值,其中Li起重要作用。然而,Li含量不足以解决所有受体,并且除了I族元素外还必须考虑其他杂质和/或固有缺陷。

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  • 来源
    《Journal of Applied Physics 》 |2009年第4期| 043706.1-043706.7| 共7页
  • 作者单位

    Department of Physics/Center for Materials Science and Nanotechnology, University of Oslo, P.O. Box 1048 Blindern, N-0316 Oslo, Norway;

    Department of Physics/Center for Materials Science and Nanotechnology, University of Oslo, P.O. Box 1048 Blindern, N-0316 Oslo, Norway;

    Department of Physics/Center for Materials Science and Nanotechnology, University of Oslo, P.O. Box 1048 Blindern, N-0316 Oslo, Norway;

    Department of Physics/Center for Materials Science and Nanotechnology, University of Oslo, P.O. Box 1048 Blindern, N-0316 Oslo, Norway;

    Department of Physics, University of Pretoria, Pretoria 0002, South Africa;

    Department of Physics, University of Pretoria, Pretoria 0002, South Africa;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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