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首页> 外文期刊>Journal of Applied Physics >Effect of surface domain structure on wall mobility in amorphous microwires
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Effect of surface domain structure on wall mobility in amorphous microwires

机译:表面域结构对非晶微丝壁迁移率的影响

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摘要

Recently reported results on domain wall propagation within the inner core of bistable Fe-based positive magnetostrictive amorphous microwires opened up the way for future spintronic applications of amorphous microwires. Domain wall propagation has also been investigated in Co-based nearly zero magnetostrictive microwires, which become bistable under certain conditions. Wall velocity and mobility values were found to be superior in the latter type of microwires due to their much smaller magnetoelastic anisotropy. In this paper, the key role played by the surface domain structure of microwires in determining the wall mobility is investigated. Wall velocity measurements have been performed on (Co_(0.94)Fe_(0.06))_(72.5)Si_(12.5)B_(15) microwires in as-cast glass-coated state and after glass removal with a hydrofluoric acid solution. Surface magnetization has been studied employing magneto-optical Kerr effect. The results show that both as-cast glass-coated microwires and microwires with the glass coating removed, which are bistable, display a helical magnetization in the surface region. The direction of the magnetization in this region affects the mobility of the propagating wall due to the stray fields associated with the preponderant components of the magnetization.
机译:最近报道的有关双稳态铁基正磁致伸缩非晶微线内芯内畴壁传播的结果为非晶微线的未来自旋电子学应用开辟了道路。还已经在基于Co的几乎为零的磁致伸缩微丝中研究了畴壁传播,该微丝在某些条件下变得双稳态。由于后一种类型的微丝的磁弹性各向异性小得多,因此发现它们的壁速度和迁移率值更高。本文研究了微线的表面域结构在确定壁迁移率中所起的关键作用。已经对铸态玻璃涂层状态的(Co_(0.94)Fe_(0.06))_(72.5)Si_(12.5)B_(15)微丝进行了壁速测量,并用氢氟酸溶液将其去除后。已经利用磁光克尔效应研究了表面磁化。结果表明,铸态的玻璃涂覆的微丝和去除了玻璃涂层的微丝都是双稳态的,在表面区域均显示出螺旋磁化强度。由于与磁化的主要成分相关的杂散场,该区域中的磁化方向会影响传播壁的迁移率。

著录项

  • 来源
    《Journal of Applied Physics 》 |2009年第2期| 29-31| 共3页
  • 作者

    H. Chiriac; T.-A. Ovari; M. Tibu;

  • 作者单位

    National Institute of R&D for Technical Physics, 47 Mangeron Boulevard, Iasi RO-700050, Romania;

    National Institute of R&D for Technical Physics, 47 Mangeron Boulevard, Iasi RO-700050, Romania;

    National Institute of R&D for Technical Physics, 47 Mangeron Boulevard, Iasi RO-700050, Romania;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
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