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Dielectric Relaxation Of Lanthanum Doped Zirconium Oxide

机译:镧掺杂氧化锆的介电弛豫

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摘要

Lanthanum doped zirconium oxide (La_x-Zr_(1-x)O_(2-δ)) films, with La contents, up to x=0.35, were studied. Films were annealed at 900 ℃ to crystallize them into phases with higher k-values. Increasing the La content suppressed the monoclinic phase and stabilized the tetragonal or cubic phase. The highest dielectric constant was obtained for a lightly doped film with a La content of x=0.09, for which a k-value of 40 was obtained. This was accompanied by a significant dielectric relaxation, following a single Curie-von Schweidler power-law dependency with frequency, changing to a mixed Curie-von Schweidler and Kohlrausch-Williams-Watts relationships after annealing. The dielectric relaxation was most severe for lightly doped films, which had the highest k-values. The dielectric relaxation appears to be related to the size of crystal grains formed during annealing, which was dependent on the doping level.
机译:研究了镧掺杂的氧化锆(La_x-Zr_(1-x)O_(2-δ))薄膜,其La含量最高为x = 0.35。薄膜在900℃退火,使其结晶成具有较高k值的相。 La含量的增加抑制了单斜晶相并稳定了四方相或立方相。对于La含量为x = 0.09的轻掺杂薄膜,其介电常数最高,其k值为40。这伴随着显着的介电弛豫,遵循单一的居里-冯·施威德勒幂律随频率的依赖关系,退火后变为居里-冯·施威德勒和科勒劳斯-威廉姆斯-瓦茨的混合关系。对于具有最高k值的轻掺杂膜,介电弛豫最严重。介电弛豫似乎与退火期间形成的晶粒的尺寸有关,这取决于掺杂水平。

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