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In situ measurement of the bonded film thickness of Z-Tetraol lubricant on magnetic recording media

机译:磁记录介质上原位测量Z-四醇润滑剂的粘结膜厚度

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摘要

Currently, the bonded film thickness of perfluoropolyether lubricant on top of magnetic recording media is measured by a two-step process. First, the media disk has to be rinsed thoroughly using a fluorocarbon solvent (for instance, Vetrel) to remove the mobile lubricant. Second, the thickness of the remaining lubricant on the media surface which is regarded as the bonded lubricant thickness is then measured either by Fourier transform infrared spectroscopy (FTIR) or electron spectroscopy for chemical analysis. As the total lubricant thickness approaches single molecular dimension (~10 A), current methods face tremendous challenge on the accuracy and sensitivity of the measurement. We studied the spectral characteristics responding to the lubricant bonding with the carbon overcoat by the time-of-flight secondary ion mass spectra and proposed to use the peak area ratio (C_3H_2F/C_3H_5O and C_4H_(10)O/C_3H_6O_2) to characterize the bonded Z-Tetraol lubricant that produces a direct bonded lubricant thickness measurement without the need to remove the mobile lubricant with a solvent. After taking the background signal of disks prior to bonding by UV irradiation into account, this method becomes independent of the total lubricant thickness as well as shows good correlation linearity (R~2~87%) with the current FTIR method for the ratio of C_4H_(10)O/C_3H_6O_2.
机译:当前,全氟聚醚润滑剂在磁记录介质上的粘结膜厚度是通过两步法测量的。首先,必须使用碳氟化合物溶剂(例如Vetrel)彻底清洗介质盘,以除去移动润滑剂。其次,然后通过傅里叶变换红外光谱法(FTIR)或电子光谱法测量介质表面上残留润滑剂的厚度(被视为粘结润滑剂的厚度),以进行化学分析。随着润滑剂总厚度接近单个分子尺寸(〜10 A),当前的方法在测量的准确性和灵敏度上面临巨大的挑战。我们通过飞行时间二次离子质谱研究了与碳外涂层结合的润滑剂的光谱特性,并提出使用峰面积比(C_3H_2F / C_3H_5O和C_4H_(10)O / C_3H_6O_2)表征结合Z-Tetraol润滑剂可直接测量粘合润滑剂的厚度,而无需用溶剂去除流动润滑剂。考虑到磁盘在通过紫外线辐照之前的背景信号后,该方法变得与总润滑剂厚度无关,并且对于当前的C_4H_比率,与当前的FTIR方法显示出良好的相关线性(R〜2〜87%)。 (10)O / C_3H_6O_2。

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  • 来源
    《Journal of Applied Physics》 |2010年第8期|p.084907.1-084907.6|共6页
  • 作者

    Lei Zhu; Feng Li;

  • 作者单位

    Material Science Laboratory, Recording Media Operation, Seagate Technology International, 16 Woodlands Loop, Singapore 738340,Material Science Laboratory RMO, Seagate Technology 16 Woodlands Loop, Singapore 738340, Republic of Singapore;

    Material Science Laboratory, Recording Media Operation, Seagate Technology International, 16 Woodlands Loop, Singapore 738340,Material Science Laboratory, Recording Media Operation, Seagate Technology International, 16 Woodlands Loop, Singapore 738340;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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